Morphology control of a rapidly grown vertically aligned carbon-nanotube forest for fiber spinning

2011 ◽  
Vol 208 (10) ◽  
pp. 2332-2334 ◽  
Author(s):  
T. Iijima ◽  
H. Oshima ◽  
Y. Hayashi ◽  
U. B. Suryavanshi ◽  
A. Hayashi ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Morphology Control ◽  
Fiber Spinning ◽  
Vertically Aligned

In-situ observation of carbon nanotube fiber spinning from vertically aligned carbon nanotube forest

2012 ◽  
Vol 24 ◽  
pp. 158-160 ◽  
Author(s):  
Toru Iijima ◽  
Hisayoshi Oshima ◽  
Yasuhiko Hayashi ◽  
Ulka Bhimrao Suryavanshi ◽  
Akari Hayashi ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Fiber Spinning ◽  
In Situ Observation ◽  
Carbon Nanotube Fiber ◽  
Vertically Aligned

Vertically Aligned Pearl-like Carbon Nanotube Arrays for Fiber Spinning

2008 ◽  
Vol 130 (4) ◽  
pp. 1130-1131 ◽  
Author(s):  
Huisheng Peng ◽  
Menka Jain ◽  
Qingwen Li ◽  
Dean E. Peterson ◽  
Yuntian Zhu ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Fiber Spinning ◽  
Nanotube Arrays ◽  
Carbon Nanotube Arrays ◽  
Vertically Aligned

Inside Back Cover: Morphology control of a rapidly grown vertically aligned carbon-nanotube forest for fi ber spinning (Phys. Status Solidi A 10/2011)

2011 ◽  
Vol 208 (10) ◽  
pp. n/a-n/a
Author(s):  
T. Iijima ◽  
H. Oshima ◽  
Y. Hayashi ◽  
U. B. Suryavanshi ◽  
A. Hayashi ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Morphology Control ◽  
Back Cover ◽  
Vertically Aligned

Fabrication of Carbon Nanotube Triode Using Helicon Plasma Cvd with Electroplated Nico Catalyst

2003 ◽  
Vol 772 ◽  
Author(s):  
Masakazu Muroyama ◽  
Kazuto Kimura ◽  
Takao Yagi ◽  
Ichiro Saito
Keyword(s):  
Carbon Nanotubes ◽  
Carbon Nanotube ◽  
Metal Catalyst ◽  
Ni Catalyst ◽  
Plasma Cvd ◽  
Helicon Plasma ◽  
Plasma Enhanced Cvd ◽  
Turn On ◽  
Aligned Carbon Nanotubes ◽  
Vertically Aligned

AbstractA carbon nanotube triode using Helicon Plasma-enhanced CVD with electroplated NiCo catalyst has been successfully fabricated. Isolated NiCo based metal catalyst was deposited at the bottom of the cathode wells by electroplating methods to control the density of carbon nanotubes and also reduce the activation energy of its growth. Helicon Plasma-enhanced CVD (HPECVD) has been used to deposit nanotubes at 400°C. Vertically aligned carbon nanotubes were then grown selectively on the electroplated Ni catalyst. Field emission measurements were performed with a triode structure. At a cathode to anode gap of 1.1mm, the turn on voltage for the gate was 170V.

scholarly journals Electrokinetics of scalable, electric-field-assisted fabrication of vertically aligned carbon-nanotube/polymer composites

2015 ◽  
Vol 117 (21) ◽  
pp. 214306 ◽  
Author(s):  
Richard J. Castellano ◽  
Cevat Akin ◽  
Gabriel Giraldo ◽  
Sangil Kim ◽  
Francesco Fornasiero ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Electric Field ◽  
Polymer Composites ◽  
Vertically Aligned

Molecular Beam-Controlled Nucleation and Growth of Vertically Aligned Single-Wall Carbon Nanotube Arrays

2005 ◽  
Vol 109 (35) ◽  
pp. 16684-16694 ◽  
Author(s):  
Gyula Eres ◽  
Anika A. Kinkhabwala ◽  
Hongtao Cui ◽  
David B. Geohegan ◽  
Alexandar A. Puretzky ◽  
...  
Keyword(s):  
Carbon Nanotube ◽  
Molecular Beam ◽  
Nucleation And Growth ◽  
Nanotube Arrays ◽  
Single Wall Carbon Nanotube ◽  
Single Wall Carbon ◽  
Carbon Nanotube Arrays ◽  
Vertically Aligned ◽  
Controlled Nucleation

scholarly journals Simulation and Optimization of a Carbon Nanotube Electron Source

2015 ◽  
Vol 21 (S4) ◽  
pp. 60-65 ◽  
Author(s):  
Alexandr Knápek ◽  
Tomáš Radlička ◽  
Stanislav Krátký
Keyword(s):  
Carbon Nanotube ◽  
Electron Beam Lithography ◽  
Fabrication Method ◽  
Vertically Aligned Carbon Nanotubes ◽  
Simulation And Optimization ◽  
Gate Structure ◽  
Aligned Carbon Nanotubes ◽  
Electric Behavior ◽  
Vertically Aligned ◽  
Structure Calculations

AbstractThis paper deals with an optimization of a field-emission structure concept based on vertically aligned carbon nanotubes (CNT). A design concept for a fabrication method for a gate structure based on electron beam lithography is reviewed in the first part of the paper. A single carbon nanotube is grown by the PECVD method inside the gate structure. Calculations and simulations that help determine gate structure proportions in order to obtain the best possible electron reduced brightness and to predict the cathode's electric behavior are also essential parts of this study.

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