scholarly journals Synthesis of localized 2D-layers of silicon nanoparticles embedded in a SiO2layer by a stencil-masked ultra-low energy ion implantation process

2007 ◽  
Vol 204 (2) ◽  
pp. 487-491 ◽  
Author(s):  
C. Dumas ◽  
J. Grisolia ◽  
L. Ressier ◽  
A. Arbouet ◽  
V. Paillard ◽  
...  
2004 ◽  
Vol 829 ◽  
Author(s):  
I. Muntele ◽  
P. Thevenard ◽  
C. Muntele ◽  
B. Chhay ◽  
D. Ila

ABSTRACTVariable size nanocluster embedded in silicon substrate were obtained by low energy implantation methods. We used optical spectroscopy to measure the optical properties of the implanted samples. The implantation parameters like the ions energy, dose and sputtering rate were calculated with SRIM [13]. Most of the implanted Zn ions (83%) clustered and oxidized during the implantation process, with the remaining 17% being oxidized during annealing in air.


2005 ◽  
Vol 86 (16) ◽  
pp. 163111 ◽  
Author(s):  
M. Shalchian ◽  
J. Grisolia ◽  
G. Ben Assayag ◽  
H. Coffin ◽  
S. M. Atarodi ◽  
...  

2008 ◽  
Vol 44 (4-5) ◽  
pp. 395-401 ◽  
Author(s):  
J. Grisolia ◽  
C. Dumas ◽  
G. Ben Assayag ◽  
C. Bonafos ◽  
S. Schamm ◽  
...  

Author(s):  
A. I. Ryabchikov ◽  
A. I. Ivanova ◽  
O. S. Korneva ◽  
D. O. Sivin

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