Optimization of aluminum-doped ZnO thin-film deposition by magnetron sputtering for liquid crystal display applications

2007 ◽  
Vol 204 (9) ◽  
pp. 3145-3151 ◽  
Author(s):  
Tadatsugu Minami ◽  
Toshihiro Miyata ◽  
Yuusuke Ohtani
Keyword(s):  
Thin Film ◽  
Liquid Crystal ◽  
Magnetron Sputtering ◽  
Liquid Crystal Display ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Zno Thin Film ◽  
Doped Zno

Two-dimensional BN-doped ZnO thin-film deposition by a thermionic vacuum arc system

2020 ◽  
Vol 31 (9) ◽  
pp. 6948-6955
Author(s):  
Mustafa Özgür ◽  
Suat Pat ◽  
Reza Mohammadigharehbagh ◽  
Uğur Demirkol ◽  
Nihan Akkurt ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Vacuum Arc ◽  
Zno Thin Film ◽  
Two Dimensional ◽  
Doped Zno ◽  
Thermionic Vacuum Arc

Al doped ZnO thin film deposition by thermionic vacuum arc

2018 ◽  
Vol 30 (1) ◽  
pp. 624-630 ◽  
Author(s):  
Mustafa Özgür ◽  
Suat Pat ◽  
Reza Mohammadigharehbagh ◽  
Caner Musaoğlu ◽  
Uğur Demirkol ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Vacuum Arc ◽  
Zno Thin Film ◽  
Doped Zno ◽  
Thermionic Vacuum Arc

Sn doped ZnO thin film deposition using thermionic vacuum arc technique

2019 ◽  
Vol 774 ◽  
pp. 1017-1023 ◽  
Author(s):  
Mustafa Özgür ◽  
Suat Pat ◽  
Reza Mohammadigharehbagh ◽  
Caner Musaoğlu ◽  
Uğur Demirkol ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Vacuum Arc ◽  
Zno Thin Film ◽  
Doped Zno ◽  
Thermionic Vacuum Arc

Investigation of the substrate effect for Zr doped ZnO thin film deposition by thermionic vacuum arc technique

2018 ◽  
Vol 29 (21) ◽  
pp. 18098-18104 ◽  
Author(s):  
Uğur Demirkol ◽  
Suat Pat ◽  
Reza Mohammadigharehbagh ◽  
Caner Musaoğlu ◽  
Mustafa Özgür ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Vacuum Arc ◽  
Substrate Effect ◽  
Zno Thin Film ◽  
Doped Zno ◽  
Thermionic Vacuum Arc

scholarly journals Studies on the Surface and Optical Properties of Ta-Doped ZnO Thin Films Deposited By Thermionic Vacuum Arc

2021 ◽  
Author(s):  
Suat Pat ◽  
Reza Mohammadigharehbagh ◽  
Nihan Akkurt ◽  
Şadan Korkmaz
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Band Gap ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Zno Thin Films ◽  
Zno Thin Film ◽  
Si Substrate ◽  
Crystal Network ◽  
Doped Zno

Abstract In this research, Ta doped ZnO thin films have been deposited onto glass and Si substrate by Thermionic vacuum arc (TVA) thin film deposition system. TVA is anodic plasma thin film deposition system and it is used to relatively high-quality thin films deposition. ZnO thin films have direct optical band gap of 3.37 eV. Tantalum is an efficient higher-valance element. Ta atom gives the more electrons compared to Zinc atom and their ionic radius are very close to each other, so substituted element does not bring into additional stress in crystal network. The deposited thin films were analyzed by field emission scanning electron microscopy (FESEM), energy dispersive X-ray spectroscopy, atomic force microscopy, UV-Vis spectrophotometry and interferometer. To change the band gap properties of the ZnO thin film, Ta doping was used and band gap of Ta doped ZnO thin film was obtained 3.1 eV by Tauc’s method. The wt % ratios for Zn/Ta were calculated as 0.45 and 0.42 for the films deposited onto glass and Si substrate, respectively. Crystallite sizes of Ta doped ZnO thin film was decreased by changing substrate material. To the best of our knowledge, substituted Ta elements connected to the oxygen atom in crystal network and orthorhombic β′-Ta2O5 were detected in the all films structure. Their band gaps of the β′-Ta2O5 were measured as 2.70 eV and 2.60 eV for Ta-doped ZnO thin films deposited onto glass and Si substrate, respectively. Up to day, the band gap of the β′-Ta2O5 was calculated by density function theory. According to results, β′-Ta2O5 structure was found as embedded from in the ZnO crystal network.

Effects of sputtering power toward the Al-doped ZnO thin Film prepared by pulsed DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6466-6471 ◽  
Author(s):  
Kittikhun Seawsakul ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Viyapol Pattantsetakul ◽  
Saksorn Limwichean ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Zno Thin Film ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Sputtering Power ◽  
Doped Zno ◽  
Pulsed Dc Magnetron Sputtering

Stability Studies on Optical and Structure Properties of Zinc Oxide Thin Films Exposed to Different Environment

2013 ◽  
Vol 667 ◽  
pp. 549-552
Author(s):  
A.S.M. Rodzi ◽  
Mohamad Hafiz Mamat ◽  
M.N. Berhan ◽  
Mohamad Rusop Mahmood
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Zinc Oxide ◽  
Absorption Coefficient ◽  
Near Infrared ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Zno Films ◽  
Zno Thin Film ◽  
Oxide Thin Films

The properties of zinc oxide thin films were prepared by sol-gel spin-coating method have been presented. This study based on optical and electrical properties of ZnO thin film. The effects of annealing temperatures that exposed with two environments properties have been investigated. Environments exposed in room (27°C) and hot (80°C) temperatures which are stored by various days. Solution preparation, thin film deposition and characterization process were involved in this project. The ZnO films were characterized using UV-Vis-NIR spectrophotometer for optical properties. From that equipment, the percentage of transmittance (%) and absorption coefficient spectra were obtained. With two environments showed have different absorption coefficient are reveal and all films have low absorbance in visible and near infrared (IR) region but have high UV absorption properties. From SEM investigations the surface morphology of ZnO thin film shows the particles size become smaller and denser in hot temperatures while in room temperatures have porosity between particles.

Optimal target sputtering mode for aluminum nitride thin film deposition by high power pulsed magnetron sputtering

Vacuum ◽  
2019 ◽  
Vol 160 ◽  
pp. 410-417 ◽  
Author(s):  
D.L. Ma ◽  
H.Y. Liu ◽  
Q.Y. Deng ◽  
W.M. Yang ◽  
K. Silins ◽  
...  
Keyword(s):  
Thin Film ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
High Power ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Optimal Target ◽  
Pulsed Magnetron
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