Novel nanoscale pheromone dispenser for more accurate evaluation of Grapholita molesta (Lepidoptera: Tortricidae) attract-and-kill strategies in the laboratory

2017 ◽  
Vol 73 (9) ◽  
pp. 1921-1926 ◽  
Author(s):  
Bruna Czarnobai De Jorge ◽  
Ricardo Bisotto-de-Oliveira ◽  
Cláudio Nunes Pereira ◽  
Josué Sant'Ana
Keyword(s):  
Grapholita Molesta ◽  
Accurate Evaluation ◽  
Pheromone Dispenser ◽  
Attract And Kill

scholarly journals Development of Wax-typed Pheromone Dispenser for Mating Discruption of the Oriental Fruit Moth, Grapholita molesta, and Its Application Technique

2008 ◽  
Vol 47 (3) ◽  
pp. 255-263 ◽  
Author(s):  
Sung-Chae Jung ◽  
Man-Woong Park ◽  
Soon-Won Lee ◽  
Kyung-Hee Choi ◽  
Yong-Pyo Hong ◽  
...  
Keyword(s):  
Oriental Fruit Moth ◽  
Grapholita Molesta ◽  
Pheromone Dispenser ◽  
Application Technique

scholarly journals Proximity Effect Aware Detailed Placement in Electron Beam Lithography

2018 ◽  
Vol 232 ◽  
pp. 04046
Author(s):  
Yuhang Chen ◽  
Zhipeng Huang ◽  
Xiongfeng Chen ◽  
Jianli Chen ◽  
Wenxing Zhu
Keyword(s):  
Electron Beam ◽  
Objective Function ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
State Of The Art ◽  
Experimental Result ◽  
Accurate Evaluation ◽  
Evaluation Scheme ◽  
Gauss Transform ◽  
Detailed Placement

Proximity effect is one of the most tremendous consequences that produces unacceptable exposures during electron beam lithography (EBL), and thus distorting the layout pattern. In this paper, we propose the first work which considers the proximity effect during layout stage. We first give an accurate evaluation scheme to estimate the proximity effect by fast Gauss transform. Then, we devote a proximity effect aware detailed placement objective function to simultaneously consider wirelength, density and proximity effect. Furthermore, cell swapping and cell matching based methods are used to optimize the objective function such that there is no overlap among cells. Compared with a state-of-the-art work, experimental result shows that our algorithm can efficiently reduce the proximity variations and maintain high wirelength quality at a reasonable runtime.

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