Development of a novel plasma probe for the investigation and control of plasma‐enhanced chemical vapor deposition coating processes

2020 ◽  
Vol 17 (11) ◽  
pp. 2000077
Author(s):  
Yuji Kasashima ◽  
Thorben Brenner ◽  
Klaus Vissing
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Probe ◽  
Chemical Vapor Deposition Coating ◽  
And Control

scholarly journals Instrumentation and control of an aerosol-assisted chemical vapor deposition system (AACVD)

DYNA ◽  
2019 ◽  
Vol 86 (210) ◽  
pp. 52-57 ◽  
Author(s):  
Eduart Yesid Castrillón González ◽  
Jorge Mario Hicapie Zapata ◽  
Beatriz Cruz Muñoz ◽  
Ruben Jose Dorantes Rodriguez ◽  
Milton Humberto Medina Barreto
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Precursor Solution ◽  
Experimental Methods ◽  
Displacement Control ◽  
Electronic Components ◽  
Hot Air ◽  
Nozzle Temperature ◽  
And Control

Aerosol-assisted chemical vapor deposition (AACVD) is a technique implicates the atomization of a precursor solution into fine droplets which are dragged by a hot air flow throughout mobile nozzle unto heated reaction zone where occurring chemical reactions. In this work, implementation of the mechanical, electrical and electronic components for AACVD in descriptive way is presented. Equipment and experimental methods implemented are described, together to the automatization criteria of nozzle, temperature control of the heating plate and nebulizing system. The flowchart, the logic sequence of the speed control programming and statistical analysis of the nozzle displacement control were completed and checked, therefore an adequate link between the diverse components via Arduino with the design and automatization criteria was achieved. Finally, we conclude that the criteria and automatization process used permitted successfully to make uniform and reproducible coatings.

scholarly journals Preparation and Control of Magnetic Properties of Ultrafine Iron Particles by Chemical Vapor Deposition of Fe(CO)5.

1994 ◽  
Vol 20 (3) ◽  
pp. 367-372
Author(s):  
Yoshiaki Sawada ◽  
Yoshiteru Kageyama ◽  
Masashi Iwata ◽  
Shigehisa Harada ◽  
Akira Tasaki
Keyword(s):  
Magnetic Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Iron Particles ◽  
And Control

Controlled growth of gallium nitride single-crystal nanowires using a chemical vapor deposition method

2003 ◽  
Vol 18 (2) ◽  
pp. 245-249 ◽  
Author(s):  
Song Han ◽  
Wu Jin ◽  
Tao Tang ◽  
Chao Li ◽  
Daihua Zhang ◽  
...  
Keyword(s):  
Gallium Nitride ◽  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Gold Clusters ◽  
Chemical Vapor Deposition Method ◽  
Nanowire Diameter ◽  
Nanobuilding Blocks ◽  
And Control

Chemical vapor deposition (CVD) using gold nanoparticles as the catalyst to grow high-quality single-crystal gallium nitride nanowires was developed. This method enables control over several important aspects of the growth, including control of the nanowire diameter by using monodispersed gold clusters, control of the nanowire location via e-beam patterning of the catalyst sites, and control of the nanowire orientation via epitaxial growth ona-plane sapphire substrates. Our work opens up new ways to use GaN nanowires as nanobuilding blocks.

scholarly journals Detection and control of single proton spins in a thin layer of diamond grown by chemical vapor deposition

2020 ◽  
Vol 117 (11) ◽  
pp. 114002
Author(s):  
Kento Sasaki ◽  
Hideyuki Watanabe ◽  
Hitoshi Sumiya ◽  
Kohei M. Itoh ◽  
Eisuke Abe
Keyword(s):  
Chemical Vapor Deposition ◽  
Thin Layer ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Single Proton ◽  
And Control
Sign in / Sign up

Export Citation Format

Share Document