High-Rate Deposition of Stoichiometric Compounds by Reactive Magnetron Sputtering at Oblique Angles
2016 ◽
Vol 13
(10)
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pp. 960-964
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2001 ◽
Vol 19
(2)
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pp. 414-419
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Keyword(s):
2006 ◽
Vol 7
(1)
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pp. 56-61
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1998 ◽
Vol 287-288
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pp. 107-118
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Keyword(s):
Keyword(s):
2010 ◽
Vol 205
(3)
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pp. 773-779
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1993 ◽
Vol 59
(1-3)
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pp. 177-182
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