Control the Composition of Tantalum Oxynitride Films by Sputtering a Tantalum Target in Ar/O2
/N2
Radiofrequency Magnetron Plasmas
2013 ◽
Vol 10
(11)
◽
pp. 990-998
◽
Keyword(s):
2001 ◽
Vol 36
(3)
◽
pp. 303-311
◽
Keyword(s):
2002 ◽
Vol 476
(1-2)
◽
pp. 85-89
◽
Keyword(s):
1999 ◽
Vol 242
(2)
◽
pp. 497-504
◽
2019 ◽
pp. 78-84
◽
2012 ◽
Vol 23
(6)
◽
pp. 1591-1595
◽
2018 ◽
Vol 21
(7)
◽