Errors induced in quartz crystal mass uptake measurements by nongravimetric effects: Considerations beyond the EerNisse caution

2006 ◽  
Vol 44 (5) ◽  
pp. 801-814 ◽  
Author(s):  
Lameck Banda ◽  
Mataz Alcoutlabi ◽  
Gregory B. McKenna
1986 ◽  
Vol 17 (13) ◽  
Author(s):  
H. SAKAGUCHI ◽  
N. TANIGUCHI ◽  
H. NAGAI ◽  
K. NIKI ◽  
G. ADACHI ◽  
...  

Langmuir ◽  
1998 ◽  
Vol 14 (2) ◽  
pp. 248-251 ◽  
Author(s):  
C. Fredriksson ◽  
S. Kihlman ◽  
M. Rodahl ◽  
B. Kasemo

1996 ◽  
Vol 37 (1-2) ◽  
pp. 91-95 ◽  
Author(s):  
R.V Bucur ◽  
J.-O Carlsson ◽  
V.M Mecea

2008 ◽  
Vol 1098 ◽  
Author(s):  
Tao Xu

AbstractTo study the hydrogen storage materials in their thin film format provides a unique approach to investigate many interfacial phenomena associated with current research on hydrogen storage materials. However, the challenge is to establish a reliable method to measure weight change of at least a few tens of nanograms in pressurized hydrogen gas. We demonstrate the application of a quartz crystal microbalance for direct mass-metric evaluation of hydrogen storage materials in the pressure range of 0˜40 bars. The frequency shift of a quartz crystal coated with hydrogen absorbing materials is affected by the hydrogen mass uptake on the crystal, the pressure and the viscosity of the gases, and the crystal surface roughness, of which the roughness contribution has no direct analytical expression. Through a control experiment on the same crystal in helium, the roughness contribution in hydrogen can be derived and the frequency shift due to the hydrogen mass uptake is obtained.


1985 ◽  
Vol 89 (25) ◽  
pp. 5550-5552 ◽  
Author(s):  
H. Sakaguchi ◽  
N. Taniguchi ◽  
H. Nagai ◽  
G. Niki ◽  
G. Adachi ◽  
...  

Author(s):  
R. W. Vook ◽  
R. Cook ◽  
R. Ziemer

During recent experiments on Au films, a qualitative correlation between hole formation and deposition rate was observed. These early studies were concerned with films 80 to 1000A thick deposited on glass at -185°C and annealed at 170°C. In the present studies this earlier work was made quantitative. Deposition rates varying between 5 and 700 A/min were used. The effects of deposition rate on hole density for two films 300 and 700A thick were investigated.Au was evaporated from an outgassed W filament located 10 cm from a glass microscope slide substrate and a quartz crystal film thickness monitor. A shutter separating the filament from the substrate and monitor made it possible to obtain a constant evaporation rate before initiating deposition. The pressure was reduced to less than 1 x 10-6 torr prior to cooling the substrate with liquid nitrogen. The substrate was cooled in 15 minutes during which the pressure continued to drop to the mid 10-7 torr range, where deposition was begun.


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