On-line CE/ESI/MS interfacing: Recent developments and applications in proteomics

PROTEOMICS ◽  
2012 ◽  
Vol 12 (19-20) ◽  
pp. 2978-2990 ◽  
Author(s):  
Jana Krenkova ◽  
Frantisek Foret
Keyword(s):  
Esi Ms ◽  
Recent Developments ◽  
On Line

Software pattern recognition applied to nanodiffraction patterns from a STEM instrument

1986 ◽  
Vol 44 ◽  
pp. 694-695
Author(s):  
G.Y. Fan ◽  
J.M. Cowley
Keyword(s):  
Image Processing ◽  
Pattern Recognition ◽  
Computer Software ◽  
Processing System ◽  
Light Level ◽  
Host Computer ◽  
Low Light ◽  
Image Processing System ◽  
Recent Developments ◽  
On Line

In recent developments, the ASU HB5 has been modified so that the timing, positioning, and scanning of the finely focused electron probe can be entirely controlled by a host computer. This made the asynchronized handshake possible between the HB5 STEM and the image processing system which consists of host computer (PDP 11/34), DeAnza image processor (IP 5000) which is interfaced with a low-light level TV camera, array processor (AP 400) and various peripheral devices. This greatly facilitates the pattern recognition technique initiated by Monosmith and Cowley. Software called NANHB5 is under development which, instead of employing a set of photo-diodes to detect strong spots on a TV screen, uses various software techniques including on-line fast Fourier transform (FFT) to recognize patterns of greater complexity, taking advantage of the sophistication of our image processing system and the flexibility of computer software.

Recent developments in automated Transmission Electron MI

1989 ◽  
Vol 47 ◽  
pp. 46-47
Author(s):  
W.J. de Ruijter ◽  
P. Rez ◽  
David J. Smith
Keyword(s):  
Image Analysis ◽  
Computer Image ◽  
Lens Design ◽  
Computer Image Analysis ◽  
Transmission Electron ◽  
Resolution Electron ◽  
Recent Developments ◽  
On Line ◽  
Routine Procedures ◽  
Near Future

There is growing interest in the on-line use of computers in high-resolution electron n which should reduce the demands on highly skilled operators and thereby extend the r of the technique. An on-line computer could obviously perform routine procedures hand, or else facilitate automation of various restoration, reconstruction and enhan These techniques are slow and cumbersome at present because of the need for cai micrographs and off-line processing. In low resolution microscopy (most biologic; primary incentive for automation and computer image analysis is to create a instrument, with standard programmed procedures. In HREM (materials researc computer image analysis should lead to better utilization of the microscope. Instru (improved lens design and higher accelerating voltages) have improved the interpretab the level of atomic dimensions (approximately 1.6 Å) and instrumental resolutior should become feasible in the near future.

High-throughput polymer screening in microreactors: boosting the Passerini three component reaction

2017 ◽  
Vol 8 (19) ◽  
pp. 2972-2978 ◽  
Author(s):  
Joris J. Haven ◽  
Evelien Baeten ◽  
Jonathan Claes ◽  
Joke Vandenbergh ◽  
Tanja Junkers
Keyword(s):  
Mass Spectrometry ◽  
High Throughput ◽  
High Throughput Screening ◽  
Reaction Monitoring ◽  
Esi Ms ◽  
Electrospray Ionisation ◽  
Ionisation Mass Spectrometry ◽  
Three Component Reaction ◽  
On Line ◽  
Ionisation Mass

The Passerini three-component reaction (Passerini-3CR) has been studied via on-line microreactor/electrospray ionisation mass spectrometry (MRT/ESI-MS) reaction monitoring to demonstrate the high-throughput screening potential of microreactors for macromolecular design.

scholarly journals Challenges in nanometrology: high precision measurement of position and size

2015 ◽  
Vol 82 (7-8) ◽  
Author(s):  
Harald Bosse ◽  
Bernd Bodermann ◽  
Gaoliang Dai ◽  
Jens Flügge ◽  
Carl G. Frase ◽  
...  
Keyword(s):  
High Precision ◽  
Precision Measurement ◽  
High Precision Measurement ◽  
Feature Size ◽  
Traceability Chain ◽  
Transmission Electron ◽  
Recent Approach ◽  
Recent Developments ◽  
On Line ◽  
Nanoscale Features

AbstractRecent developments of the PTB in high precision position and size metrology as support for different nanotechnology applications are described. Measurement uncertainties of 1–2 nm for 1D-position of graduation lines on photomasks, or on line scales and incremental encoders of about 300 mm length have been achieved. The measurement of the size of nanoscale features represents additional challenges, because the location of opposite feature edges needs to be precisely determined. Different feature size or CD metrology techniques are applied at PTB, including a recent approach which uses transmission electron microscopy in the traceability chain of AFM CD measurements. The estimated uncertainty for CD measurements on high quality Si line structures is

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