20.1%-efficient crystalline silicon solar cell with amorphous silicon rear-surface passivation

2005 ◽  
Vol 13 (5) ◽  
pp. 381-386 ◽  
Author(s):  
Martin Schaper ◽  
Jan Schmidt ◽  
Heiko Plagwitz ◽  
Rolf Brendel
Keyword(s):  
Solar Cell ◽  
Amorphous Silicon ◽  
Silicon Solar Cell ◽  
Surface Passivation ◽  
Crystalline Silicon ◽  
Rear Surface ◽  
Crystalline Silicon Solar Cell

Research on the surface passivation of nanostructure-textured crystalline silicon solar cell

2012 ◽  
Vol 56 (1) ◽  
pp. 120-124 ◽  
Author(s):  
BingFei Dou ◽  
Rui Jia ◽  
HaoFeng Li ◽  
Chen Chen ◽  
YanLong Meng ◽  
...  
Keyword(s):  
Solar Cell ◽  
Silicon Solar Cell ◽  
Surface Passivation ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell

scholarly journals Measurements and Simulations on the Mechanisms of Efficiency Losses in HIT Solar Cells

2015 ◽  
Vol 2015 ◽  
pp. 1-7 ◽  
Author(s):  
Silvio Pierro ◽  
Andrea Scuto ◽  
Luca Valenti ◽  
Marina Foti ◽  
Anna Battaglia ◽  
...  
Keyword(s):  
Solar Cell ◽  
Amorphous Silicon ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Silicon Layer ◽  
Crystalline Silicon Solar Cell ◽  
Optical Efficiency ◽  
Efficiency Losses ◽  
Optical Behavior ◽  
Tcad Simulations

We study the electrical and the optical behavior of HIT solar cell by means of measurements and optoelectrical simulations by TCAD simulations. We compare the HIT solar cell with a conventional crystalline silicon solar cell to identify the strengths and weaknesses of the HIT technology. Results highlight different mechanisms of electrical and optical efficiency losses caused by the presence of the amorphous silicon layer. The higher resistivity of the a-Si layers implies a smaller distance between the metal lines that causes a higher shadowing. The worst optical coupling between the amorphous silicon and the antireflective coating implies a slight increase of reflectivity around the 600 nm wavelength.

The SiNx films process research by plasma-enhanced chemical vapor deposition in crystalline silicon solar cells

2017 ◽  
Vol 31 (16-19) ◽  
pp. 1744101 ◽  
Author(s):  
Bitao Chen ◽  
Yingke Zhang ◽  
Qiuping Ouyang ◽  
Fei Chen ◽  
Xinghua Zhan ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Chemical Vapor ◽  
Double Layers ◽  
Crystalline Silicon Solar Cell

SiNx thin film has been widely used in crystalline silicon solar cell production because of the good anti-reflection and passivation effect. We can effectively optimize the cells performance by plasma-enhanced chemical vapor deposition (PECVD) method to change deposition conditions such as temperature, gas flow ratio, etc. In this paper, we deposit a new layer of SiNx thin film on the basis of double-layers process. By changing the process parameters, the compactness of thin films is improved effectively. The NH3passivation technology is augmented in a creative way, which improves the minority carrier lifetime. In sight of this, a significant increase is generated in the photoelectric performance of crystalline silicon solar cell.

Sub-5 µm Thin Film Crystalline Silicon Solar Cell on Alumina Ceramic Substrate

1993 ◽  
Vol 32 (Part 2, No. 6A) ◽  
pp. L770-L773 ◽  
Author(s):  
Kenichi Ishii ◽  
Hideshi Nishikawa ◽  
Tetsuo Takahashi ◽  
Yutaka Hayashi
Keyword(s):  
Thin Film ◽  
Solar Cell ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Alumina Ceramic ◽  
Ceramic Substrate ◽  
Crystalline Silicon Solar Cell
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