Photoresist materials comprising photobase generators and epoxy resins bearing carboxylic acids to lead to marked enhancement of base-catalyzed cross-linking reactions
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2011 ◽
Vol 116
(1)
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pp. 352-360
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1984 ◽
pp. 3-14
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1987 ◽
Vol 7
(1)
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pp. 33-38
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2009 ◽
Vol 22
(10)
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pp. 1427-1433
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2009 ◽
Vol 371
(1-2)
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pp. 10-16
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