Dielectric properties characterization of high dielectric constant thick films

2010 ◽  
Vol 52 (10) ◽  
pp. 2339-2344 ◽  
Author(s):  
Luciene S. Demenicis ◽  
José Ignacio Marulanda ◽  
Rodolfo A. A. Lima ◽  
Maria Cristina R. Carvalho
Keyword(s):  
Dielectric Constant ◽  
Dielectric Properties ◽  
High Dielectric Constant ◽  
Thick Films ◽  
High Dielectric ◽  
Properties Characterization

Optical properties and band gap characterization of high dielectric constant oxides

2012 ◽  
Vol 520 (14) ◽  
pp. 4532-4535 ◽  
Author(s):  
O. Fursenko ◽  
J. Bauer ◽  
G. Lupina ◽  
P. Dudek ◽  
M. Lukosius ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Optical Properties ◽  
Band Gap ◽  
High Dielectric Constant ◽  
High Dielectric

Pulsed DC Magnetron Sputtered Rutile TiO2 films for next generation DRAM capacitors

2013 ◽  
Vol 1561 ◽  
Author(s):  
M.A Jithin ◽  
Lakshmi Ganapathi Kolla ◽  
Navakanta Bhat ◽  
S. Mohan ◽  
Yuichiro Morozumi ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
High Dielectric Constant ◽  
Low Dielectric Constant ◽  
Si Substrate ◽  
Capacitance Density ◽  
Low Dielectric ◽  
Pulsed Dc ◽  
High Dielectric ◽  
Mim Capacitors

ABSTRACTIn this study, synthesis and characterization of rutile-Titanium dioxide (TiO2) thin films using pulsed DC Magnetron Sputtering at room temperature, along with the fabrication and characterization of MIM capacitors have been discussed. XPS and RBS data show that the films are stoichiometric and have compositional uniformity. The influence of electrode materials on electrical characteristics of the fabricated MIM capacitors has been studied. The Al/TiO2/Al based capacitors show low capacitance density (9 fF/μm2) with low dielectric constant (K=25) and high EOT (3.67 nm) due to low dielectric constant TiO2 phase formation on Al/Si substrate. On the other hand, Ru/TiO2/Ru based capacitors show high capacitance density (49 fF/μm2) with high dielectric constant (K=130) and low EOT (0.7nm) values at high frequency (100 KHz) due to high dielectric constant phase (rutile) formation of TiO2, on Ru/Si substrate. Raman spectra confirm that the films deposited on Ru/Si substrate show the rutile phase.

Preparation, Morphology and Dielectric Properties of Polyamide-6/Poly(Vinylidene Fluoride) Blends

2012 ◽  
Vol 496 ◽  
pp. 263-267
Author(s):  
Rui Li ◽  
Jian Zhong Pei ◽  
Yan Wei Li ◽  
Xin Shi ◽  
Qun Le Du
Keyword(s):  
Dielectric Constant ◽  
Dielectric Properties ◽  
Flexible Electronics ◽  
High Dielectric Constant ◽  
Vinylidene Fluoride ◽  
Volume Fraction ◽  
Polyamide 6 ◽  
Dielectric Constants ◽  
Poly Vinylidene Fluoride ◽  
High Dielectric

A novel all-polymeric material with high dielectric constant (k) has been developed by blending poly (vinylidene fluoride) (PVDF) with polyamide-6 (PA6). The dependence of the dielectric properties on frequency and polymer volume fraction was investigated. When the volume fraction of PA6 is 20%, the dielectric property is better than others. The SEM investigations suggest that the enhanced dielectric behavior originates from significant interfacial interactions of polymer-polymer. The XRD demonstrate that the PA6 and PVDF affect the crystalline behavior of each component. Furthermore, the stable dielectric constants of the blends could be tuned by adjusting the content of the polymers. The created high-k all-polymeric blends represent a novel type of material that are simple technology and easy to process, and is of relatively high dielectric constant, applications as flexible electronics.

Effect of Platinum Substitution on the Microstructures and Dielectric Relaxation of CaCu3Ti4O12 Ceramics

2013 ◽  
Vol 802 ◽  
pp. 134-138 ◽  
Author(s):  
Worawut Makcharoen
Keyword(s):  
Dielectric Constant ◽  
Dielectric Properties ◽  
Loss Tangent ◽  
Room Temperature ◽  
High Dielectric Constant ◽  
Ferroelectric Materials ◽  
X Ray Diffraction ◽  
High Loss ◽  
Internal Barrier Layer Capacitor ◽  
High Dielectric

The CaCu3Ti4O12(CCTO) has the advantage for the various applications especially for capacitive elements in microelectronic devices over the ferroelectric materials including BaTiO3. CCTO is a ceramic compound with a high dielectric constant but it has a high loss tangent at room temperature. In this work, the Influences of PtO2doping on the dielectric properties of CaCu3Ti4O12(CCTO) ceramics were investigate. The ceramics CCTO and PtO2doping CCTO were studied by X- ray diffraction, scanning electron microscopy. The dielectric properties have been measured as a function of temperature and frequency range 0.1 - 500 kHz. The XRD shows the CCTO structure does not changes after doping with platinum. The results show that PtO2doped can reduce the mean grain sizes of CCTO, but the dielectric constant still remained a height. The samples of 2.0 mol% Pt-doped have exhibited high dielectric constant of about 22,000 and the loss tangent about 0.7 at room temperature and frequency at 10 kHz. The reduced of the loss tangent could be interpreted with the internal barrier layer capacitor model (IBLC)

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