Experimental characterization of a planar transmission-line transformer in multilayered high dielectric constant film structure

2010 ◽  
Vol 52 (6) ◽  
pp. 1337-1340 ◽  
Author(s):  
Luciene S. Demenicis ◽  
Luiz Fernando M. Conrado ◽  
Walter Margulis ◽  
Maria Cristina R. Carvalho
Keyword(s):  
Dielectric Constant ◽  
Transmission Line ◽  
High Dielectric Constant ◽  
Film Structure ◽  
Experimental Characterization ◽  
High Dielectric

Optical properties and band gap characterization of high dielectric constant oxides

2012 ◽  
Vol 520 (14) ◽  
pp. 4532-4535 ◽  
Author(s):  
O. Fursenko ◽  
J. Bauer ◽  
G. Lupina ◽  
P. Dudek ◽  
M. Lukosius ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Optical Properties ◽  
Band Gap ◽  
High Dielectric Constant ◽  
High Dielectric

Pulsed DC Magnetron Sputtered Rutile TiO2 films for next generation DRAM capacitors

2013 ◽  
Vol 1561 ◽  
Author(s):  
M.A Jithin ◽  
Lakshmi Ganapathi Kolla ◽  
Navakanta Bhat ◽  
S. Mohan ◽  
Yuichiro Morozumi ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
High Dielectric Constant ◽  
Low Dielectric Constant ◽  
Si Substrate ◽  
Capacitance Density ◽  
Low Dielectric ◽  
Pulsed Dc ◽  
High Dielectric ◽  
Mim Capacitors

ABSTRACTIn this study, synthesis and characterization of rutile-Titanium dioxide (TiO2) thin films using pulsed DC Magnetron Sputtering at room temperature, along with the fabrication and characterization of MIM capacitors have been discussed. XPS and RBS data show that the films are stoichiometric and have compositional uniformity. The influence of electrode materials on electrical characteristics of the fabricated MIM capacitors has been studied. The Al/TiO2/Al based capacitors show low capacitance density (9 fF/μm2) with low dielectric constant (K=25) and high EOT (3.67 nm) due to low dielectric constant TiO2 phase formation on Al/Si substrate. On the other hand, Ru/TiO2/Ru based capacitors show high capacitance density (49 fF/μm2) with high dielectric constant (K=130) and low EOT (0.7nm) values at high frequency (100 KHz) due to high dielectric constant phase (rutile) formation of TiO2, on Ru/Si substrate. Raman spectra confirm that the films deposited on Ru/Si substrate show the rutile phase.

Synthesis and electrochemical characterization of electroactive IoNanofluids with high dielectric constants from hydrated ferrous sulphate

2019 ◽  
Vol 55 (1) ◽  
pp. 83-86 ◽  
Author(s):  
Aswathy Joseph ◽  
Marylin Mary Xavier ◽  
Jacek Fal ◽  
Gaweł Żyła ◽  
Soorya Sasi ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
High Stability ◽  
High Dielectric Constant ◽  
Ferrous Sulphate ◽  
Dielectric Constants ◽  
Microwave Assisted ◽  
Low Viscosity ◽  
One Step ◽  
High Dielectric

An iron oxide based-electroactive IoNanofluid with a high dielectric constant, high stability and low viscosity was synthesized from ferrous sulphate heptahydrate via a facile microwave assisted one-step route in 1-butyl-4-methylpyridinium chloride.

Transmission-line transformers in multilayered high-dielectric-constant thin-film structures

2005 ◽  
Vol 47 (3) ◽  
pp. 290-293 ◽  
Author(s):  
Luciene S. Demenicis ◽  
Luiz Fernando M. Conrado ◽  
Walter Margulis ◽  
Maria Cristina R. Carvalho
Keyword(s):  
Thin Film ◽  
Dielectric Constant ◽  
Transmission Line ◽  
High Dielectric Constant ◽  
High Dielectric
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