High-quality-factor (33) and high-resonant-frequency (35 GHz) spiral inductors fabricated in 0.25-?M mixed-signal/RF-CMOS technology

2004 ◽  
Vol 41 (4) ◽  
pp. 279-285
Author(s):  
Yo-Sheng Lin ◽  
Shen-Hong Wu ◽  
Hong-Wei Chiu ◽  
Shey-Shi Lu
Keyword(s):  
Resonant Frequency ◽  
Quality Factor ◽  
Cmos Technology ◽  
High Quality Factor ◽  
Rf Cmos ◽  
High Quality ◽  
Mixed Signal ◽  
Spiral Inductors ◽  
High Resonant Frequency

Dual Band VCO Based on a High-Quality Factor Switched Interdigital Resonator for the Ku Band Using 180-nm CMOS Technology

2018 ◽  
Vol 65 (12) ◽  
pp. 1874-1878 ◽  
Author(s):  
Islam Mansour ◽  
Mohamed Aboualalaa ◽  
Ahmed Allam ◽  
Adel B. Abdel-Rahman ◽  
Mohammed Abo-Zahhad ◽  
...  
Keyword(s):  
Quality Factor ◽  
Cmos Technology ◽  
High Quality Factor ◽  
Dual Band ◽  
High Quality ◽  
Ku Band

scholarly journals Digitally-Controlled Bondwire Inductor with High Quality Factor and Wide Tuning Range

2020 ◽  
Vol 20 (3) ◽  
pp. 207-212
Author(s):  
Yonggoo Lee ◽  
Bomson Lee
Keyword(s):  
Quality Factor ◽  
Integrated Circuit ◽  
Tuning Range ◽  
Complementary Metal Oxide Semiconductor ◽  
Cmos Technology ◽  
High Quality Factor ◽  
Silicon On Insulator ◽  
Oxide Semiconductor ◽  
Wide Tuning Range ◽  
High Quality

A tunable bondwire inductor (TBI) with high-quality factor and wide tuning range is presented. The proposed TBI is fabricated on a single chip by combining a single-pole four-throw (SP4T) switch integrated circuit (IC) and four bondwire inductors on a package substrate. The SP4T switch IC is fabricated using 180 nm silicon-on-insulator (SOI) complementary metal-oxide-semiconductor (CMOS) technology. The fabricated TBI chip exhibits a 521% tuning range of inductance from 1.77 to 11 nH at 0.1 GHz and a relatively high-quality factor. To the knowledge of the authors, the results of this work demonstrate the best combined performance of inductance tuning range and quality factor.

scholarly journals IMPROVED PERFORMANCE OF LNA USING HIGH QUALITY FACTOR PGS ON-CHIP SPIRAL INDUCTORS

2020 ◽  
Vol 38 (2) ◽  
pp. 161-171
Author(s):  
Mahmoud A. Abdelghany ◽  
Yehia S. Mohamed ◽  
Asmaa R.Wardany
Keyword(s):  
Quality Factor ◽  
High Quality Factor ◽  
High Quality ◽  
Spiral Inductors ◽  
Improved Performance ◽  
On Chip

A Long Bar Type Silicon Resonator with a High Quality Factor

2014 ◽  
Vol 134 (2) ◽  
pp. 26-31 ◽  
Author(s):  
Nguyen Van Toan ◽  
Masaya Toda ◽  
Yusuke Kawai ◽  
Takahito Ono
Keyword(s):  
Quality Factor ◽  
High Quality Factor ◽  
High Quality ◽  
Type Silicon ◽  
Silicon Resonator

scholarly journals Coherent suppression of backscattering in optical microresonators

2020 ◽  
Vol 9 (1) ◽  
Author(s):  
Andreas Ø. Svela ◽  
Jonathan M. Silver ◽  
Leonardo Del Bino ◽  
Shuangyou Zhang ◽  
Michael T. M. Woodley ◽  
...  
Keyword(s):  
Quality Factor ◽  
Bulk Material ◽  
Near Field ◽  
High Quality Factor ◽  
Dual Frequency ◽  
High Quality ◽  
Frequency Combs ◽  
Optical Microresonators ◽  
Whispering Gallery ◽  
The Stability

AbstractAs light propagates along a waveguide, a fraction of the field can be reflected by Rayleigh scatterers. In high-quality-factor whispering-gallery-mode microresonators, this intrinsic backscattering is primarily caused by either surface or bulk material imperfections. For several types of microresonator-based experiments and applications, minimal backscattering in the cavity is of critical importance, and thus, the ability to suppress backscattering is essential. We demonstrate that the introduction of an additional scatterer into the near field of a high-quality-factor microresonator can coherently suppress the amount of backscattering in the microresonator by more than 30 dB. The method relies on controlling the scatterer position such that the intrinsic and scatterer-induced backpropagating fields destructively interfere. This technique is useful in microresonator applications where backscattering is currently limiting the performance of devices, such as ring-laser gyroscopes and dual frequency combs, which both suffer from injection locking. Moreover, these findings are of interest for integrated photonic circuits in which back reflections could negatively impact the stability of laser sources or other components.

Multifold coupling enabled high quality factor toroidal resonances in metasurfaces

2020 ◽  
Vol 127 (19) ◽  
pp. 193103
Author(s):  
Deepak Kumar ◽  
Surya Pranav Ambatipudi ◽  
Sabyasachi Banerjee ◽  
Ranjan Kumar ◽  
Dibakar Roy Chowdhury
Keyword(s):  
Quality Factor ◽  
High Quality Factor ◽  
High Quality
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