Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography

2015 ◽  
Vol 36 (8) ◽  
pp. 762-767 ◽  
Author(s):  
Cian Cummins ◽  
Roisin A. Kelly ◽  
Anushka Gangnaik ◽  
Yordan M. Georgiev ◽  
Nikolay Petkov ◽  
...  
2021 ◽  
Author(s):  
Gayashani Ginige ◽  
Youngdong Song ◽  
Brian Olsen ◽  
Erik Luber ◽  
Cafer Yavuz ◽  
...  

Self-assembly of block copolymers (BCP) is an alternative patterning technique that promises sublithographic resolution and density multiplication. Defectivity of the resulting nanopatterns remains too high for many applications in microelectronics, and is exacerbated by small variations of processing parameters, such as film thickness, and fluctuations of solvent vapour pressure and temperature, among others. In this work, a solvent vapor annealing (SVA) flow-controlled system is combined with Design of Experiments (DOE) and machine learning (ML) approaches.<br>


2021 ◽  
Author(s):  
Gayashani Ginige ◽  
Youngdong Song ◽  
Brian Olsen ◽  
Erik Luber ◽  
Cafer Yavuz ◽  
...  

Self-assembly of block copolymers (BCP) is an alternative patterning technique that promises sublithographic resolution and density multiplication. Defectivity of the resulting nanopatterns remains too high for many applications in microelectronics, and is exacerbated by small variations of processing parameters, such as film thickness, and fluctuations of solvent vapour pressure and temperature, among others. In this work, a solvent vapor annealing (SVA) flow-controlled system is combined with Design of Experiments (DOE) and machine learning (ML) approaches.<br>


Nano Energy ◽  
2020 ◽  
Vol 67 ◽  
pp. 104207 ◽  
Author(s):  
Wan Sik Kim ◽  
Gopinathan Anoop ◽  
Il-Seok Jeong ◽  
Hye Jeong Lee ◽  
Hyun Bin Kim ◽  
...  

2018 ◽  
Vol 5 (9) ◽  
pp. 1870040
Author(s):  
Edmund K. Burnett ◽  
Jack Ly ◽  
Muhammad R. Niazi ◽  
Lei Zhang ◽  
Samantha R. McCuskey ◽  
...  

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