Complex Macrophase-Separated Nanostructure Induced by Microphase Separation in Binary Blends of Lamellar Diblock Copolymer Thin Films

2014 ◽  
Vol 35 (18) ◽  
pp. 1622-1629 ◽  
Author(s):  
Jianqi Zhang ◽  
Dorthe Posselt ◽  
Detlef-M. Smilgies ◽  
Jan Perlich ◽  
Konstantinos Kyriakos ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymer ◽  
Microphase Separation ◽  
Binary Blends

Phase Coherence and Microphase Separation Transitions in Diblock Copolymer Thin Films

1999 ◽  
Vol 32 (15) ◽  
pp. 4832-4837 ◽  
Author(s):  
P. Mansky ◽  
O. K. C. Tsui ◽  
T. P. Russell ◽  
Y. Gallot
Keyword(s):  
Thin Films ◽  
Diblock Copolymer ◽  
Microphase Separation ◽  
Phase Coherence

Block Copolymer Thin Films Above and Below the Order-Disorder Transition Temperature

2000 ◽  
Vol 629 ◽  
Author(s):  
Ratchana Limary ◽  
Peter F. Green
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Molecular Weight ◽  
Transition Temperature ◽  
Block Copolymer ◽  
Film Thickness ◽  
Diblock Copolymer ◽  
Diblock Copolymers ◽  
Microphase Separation ◽  
Disorder Transition Temperature

ABSTRACTSymmetric diblock copolymers undergo a disorder to order transition below a microphase separation transition temperature. In this temperature range the structure is characterized by alternating lamellae of thickness L. In thin film geometries, the lamellae are oriented normal to the substrate if there is a preferential interaction between either of the block constituents and the substrate/copolymer or copolymer/vacuum interfaces. Depending on the relation between the film thickness and L, the topography of the film might comprise of holes, islands or spinodal-like structures. We show that in a polystyrene-b-poly(methyl methacrylate) diblock copolymer of molecular weight 20, 000 g/mol, above the microphase separation transition temperature, the topography of the film depends on the thickness. A heirarchy of bicontinuous patterns and holes is observed with increasing film thickness for films thinner than 35 nm.

Investigation of Diblock Copolymer thin film Morphology for Nanolithography

1996 ◽  
Vol 461 ◽  
Author(s):  
Miri Park ◽  
Christopher Harrison ◽  
Paul M. Chaikin ◽  
Richard A. Register ◽  
Douglas Adamson ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Diblock Copolymer ◽  
Diblock Copolymers ◽  
Microphase Separation ◽  
Large Area ◽  
Etching Technique ◽  
Copolymer Films ◽  
Self Assembled ◽  
Self Assembled Layer

ABSTRACTThe microphase separated morphology of diblock copolymers can be used to generate well-ordered nanometer scale patterns over a large area. To achieve this goal, it is important to understand and control the behavior of diblock copolymer thin films on substrates, which can differ from the bulk behavior. We have investigated the morphologies and ordering in thin polystyrene-polybutadiene (PS-PB) diblock copolymer films on bare silicon and silicon nitride substrates, and also on polymethylmethacrylate (PMMA) coated substrates. The PS-PB copolymers are synthesized to form, in bulk, PB cylinders or spheres in a PS matrix. In thin films (10–60 nm thick), prepared by spin-coating, we observe that the morphology and ordering of the microdomains are affected by strong wetting constraints and a reduced chain mobility on the substrate. The thinnest self-assembled layer of the copolymer films shows no in-plane microphase separation on both types of substrates. The PS blocks wet the PMMA substrates whereas the PB blocks wet the bare substrates as well as the air interface. Hence, different film thicknesses are necessary on the two types of substrates to obtain a uniform film of the first self-assembled cylindrical or spherical microdomain layer. The first layer of the cylindrical copolymer can vary from cylindrical to spherical morphology with a few nanometer decrease in film thickness. In the case of spherical PS-PB diblock copolymer films, we observe that the ordering of the microdomains is improved in the films on the PMMA substrates, compared to those on the bare substrates. We also demonstrate a successful transfer of the microdomain patterns to silicon nitride substrates by a reactive ion etching technique.

Solvent-induced microphase separation in diblock copolymer thin films with reversibly switchable morphology

2004 ◽  
Vol 120 (23) ◽  
pp. 11163-11170 ◽  
Author(s):  
Juan Peng ◽  
Yu Xuan ◽  
Hanfu Wang ◽  
Yuming Yang ◽  
Binyao Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Diblock Copolymer ◽  
Microphase Separation

scholarly journals Step Edges in Thin Films of Lamellar-Forming Diblock Copolymer

2012 ◽  
Vol 45 (23) ◽  
pp. 9531-9538 ◽  
Author(s):  
P. Stasiak ◽  
J. D. McGraw ◽  
K. Dalnoki-Veress ◽  
M. W. Matsen
Keyword(s):  
Thin Films ◽  
Diblock Copolymer ◽  
Step Edges

Simulations of the Morphology of Cylinder-Forming Asymmetric Diblock Copolymer Thin Films on Nanopatterned Substrates

2003 ◽  
Vol 36 (5) ◽  
pp. 1731-1740 ◽  
Author(s):  
Qiang Wang ◽  
Paul F. Nealey ◽  
Juan J. de Pablo
Keyword(s):  
Thin Films ◽  
Diblock Copolymer

Bacterial adhesion to toroidal nano-structures from poly(styrene)-block-poly(tert-butyl acrylate) diblock copolymer thin films

2010 ◽  
Vol 87 (5-8) ◽  
pp. 715-718 ◽  
Author(s):  
Shuyan Li ◽  
Andras Z. Komaromy ◽  
Dan V. Nicolau ◽  
Reinhard I. Boysen ◽  
Milton T.W. Hearn
Keyword(s):  
Thin Films ◽  
Diblock Copolymer ◽  
Butyl Acrylate ◽  
Bacterial Adhesion ◽  
Tert Butyl ◽  
Nano Structures
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