Long term performance of atomic layer deposition coatings for corrosion protection of stainless steel

2015 ◽  
Vol 66 (9) ◽  
pp. 907-914 ◽  
Author(s):  
E. Marin ◽  
A. Lanzutti ◽  
L. Paussa ◽  
L. Guzman ◽  
L. Fedrizzi
Keyword(s):  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Corrosion Protection ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Long Term Performance ◽  
Term Performance

Multilayer Al2O3/TiO2 Atomic Layer Deposition coatings for the corrosion protection of stainless steel

2012 ◽  
Vol 522 ◽  
pp. 283-288 ◽  
Author(s):  
E. Marin ◽  
L. Guzman ◽  
A. Lanzutti ◽  
W. Ensinger ◽  
L. Fedrizzi
Keyword(s):  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Corrosion Protection ◽  
Atomic Layer ◽  
Layer Deposition

Atomic Layer Deposition of a Nanometer-Thick Li3PO4 Protective Layer on LiNi0.5Mn1.5O4 Films: Dream or Reality for Long-Term Cycling?

2021 ◽  
Vol 13 (13) ◽  
pp. 15761-15773
Author(s):  
Maxime Hallot ◽  
Borja Caja-Munoz ◽  
Clement Leviel ◽  
Oleg I. Lebedev ◽  
Richard Retoux ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Protective Layer ◽  
Atomic Layer ◽  
Layer Deposition

Photocatalytic effect of thermal atomic layer deposition of TiO2 on stainless steel

2011 ◽  
Vol 104 (1-2) ◽  
pp. 6-11 ◽  
Author(s):  
Hyemin Kang ◽  
Chang-Soo Lee ◽  
Do-Young Kim ◽  
Jungwon Kim ◽  
Wonyong Choi ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Photocatalytic Effect ◽  
Layer Deposition

Atomic Layer Deposition of Lithium-Silicon-Tin Oxide Nanofilms for High Performance Thin Film Batteries Anodes

2020 ◽  
Vol 299 ◽  
pp. 1058-1063
Author(s):  
Denis Nazarov ◽  
Ilya Mitrofanov ◽  
Maxim Yu. Maximov
Keyword(s):  
Thin Film ◽  
Stainless Steel ◽  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Cycling Performance ◽  
Spectral Ellipsometry ◽  
X Ray ◽  
Layer Deposition

Tin oxide is the most promising material for thin film anodes of Li-ion batteries due to its cycling performance and high theoretical capacity. It is assumed that lithium-tin oxide can demonstrate even higher performance. Lithium-silicon-tin oxide nanofilms were prepared by atomic layer deposition (ALD), using the lithium bis (trimethylsilyl) amide (LiHMDS), tetraethyltin (TET) as a metal containing reagents and ozone or water or oxygen plasma as counter-reactants. Monocrystalline silicon (100) and stainless steel (316SS) were used as supports. The thicknesses of the nanofilms were measured by spectral ellipsometry (SE) and scanning electron microscopy (SEM). It was found that oxygen plasma is the most optimal ALD counter-reactant. The composition and structure were studied by Time-of-Flight Secondary Ion Mass Spectroscopy (ToF-SIMS), X-ray Photoelectron Spectroscopy (XPS) and X-ray diffraction (XRD). The nanofilms contain silicon as impurity, whose source is the ALD precursor (LiHMDS). The nanofilms deposited on stainless steel have shown the high Coulombic efficiency (99.1-99.8%) and cycling performance at a relatively high voltage (0.01 to 2.0V).

scholarly journals Atomic Layer Deposition for Preparation of Highly Efficient Catalysts for Dry Reforming of Methane

Catalysts ◽  
2019 ◽  
Vol 9 (3) ◽  
pp. 266 ◽  
Author(s):  
Soong Kim ◽  
Byeong Cha ◽  
Shahid Saqlain ◽  
Hyun Seo ◽  
Young Kim
Keyword(s):  
Atomic Layer Deposition ◽  
Heterogeneous Catalysts ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Dry Reforming ◽  
Dry Reforming Of Methane ◽  
High Catalytic Activity ◽  
Term Operation ◽  
Layer Deposition

In this article, the structural and chemical properties of heterogeneous catalysts prepared by atomic layer deposition (ALD) are discussed. Oxide shells can be deposited on metal particles, forming shell/core type catalysts, while metal nanoparticles are incorporated into the deep inner parts of mesoporous supporting materials using ALD. Both structures were used as catalysts for the dry reforming of methane (DRM) reaction, which converts CO2 and CH4 into CO and H2. These ALD-prepared catalysts are not only highly initially active for the DRM reaction but are also stable for long-term operation. The origins of the high catalytic activity and stability of the ALD-prepared catalysts are thoroughly discussed.

scholarly journals Corrosion protection of Cu by atomic layer deposition

2019 ◽  
Vol 37 (6) ◽  
pp. 060902 ◽  
Author(s):  
Véronique Cremers ◽  
Geert Rampelberg ◽  
Kitty Baert ◽  
Shoshan Abrahami ◽  
Nathalie Claes ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Corrosion Protection ◽  
Atomic Layer ◽  
Layer Deposition

Ultra-thin Al2O3 films grown by atomic layer deposition for corrosion protection of copper

RSC Advances ◽  
2014 ◽  
Vol 4 (92) ◽  
pp. 50503-50509 ◽  
Author(s):  
Zhimin Chai ◽  
Yuhong Liu ◽  
Jing Li ◽  
Xinchun Lu ◽  
Dannong He
Keyword(s):  
Atomic Layer Deposition ◽  
Corrosion Protection ◽  
Copper Substrate ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Al2o3 Films

Ultra-thin Al2O3 films with thickness in the range of 4.5–29.4 nm were prepared on a copper substrate by atomic layer deposition (ALD) at the temperature of 150 °C to protect the substrate from corrosion.

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