Phage display screening in low dielectric media

2008 ◽  
Vol 21 (5) ◽  
pp. 330-337 ◽  
Author(s):  
Linus Olofsson ◽  
Pernilla Söderberg ◽  
Jonas Ankarloo ◽  
Ian A. Nicholls
1995 ◽  
Vol 117 (47) ◽  
pp. 11809-11810 ◽  
Author(s):  
William L. Jorgensen ◽  
Nora A. McDonald ◽  
Massimo Selmi ◽  
Paul R. Rablen

1973 ◽  
Vol 26 (6) ◽  
pp. 1207 ◽  
Author(s):  
WW Fee ◽  
DE McElholum ◽  
AJ McPherson ◽  
DL Rundle

The kinetics of copper(II)-promoted solvolyses of bis(N,N- dibutyldithiocarbamato)nickel(II) in dimethyl sulphoxide (dmso), N,N- dimethylacetamide (dma), acetone, and chloroform, and bis(N,N- dicyclohexyldithiocarbamato)nickel(II) in dmso and dma have been examined. Although the reaction stoichiometry differs in chloroform compared with the other solvents, in all media the two-term rate law ����������������� -d[Ni(dtc)2]/dt = (k1+k2[Cu2+])[Ni(dtc)2] is obeyed. However, in the absence of added sodium and nickel ions, experiments in dmso at low [Cu2+]O, indicate a negligible contribution from the k1 path. Results are discussed in the light of a mechanism involving primary dissociative (k1) and associative (k2) steps. Although the ratios k2/k1 indicate overall importance for the associative pathways of reaction in the low dielectric media cf. dmso and dma, the k1 term also appears as a significant contributor to the reaction of the dibutyldithiocarbamate complex in the former solvents.


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