scholarly journals Review of thin-layer placement applications to enhance natural recovery of contaminated sediment

2010 ◽  
Vol 6 (4) ◽  
pp. 749-760 ◽  
Author(s):  
Karen A Merritt ◽  
Jason Conder ◽  
Victoria Kirtay ◽  
D Bart Chadwick ◽  
Victor Magar
Keyword(s):  
Thin Layer ◽  
Contaminated Sediment ◽  
Natural Recovery

Sequential risk mitigation and the role of natural recovery in contaminated sediment projects

1998 ◽  
Vol 37 (6-7) ◽  
pp. 331-336 ◽  
Author(s):  
Stephen Garbaciak ◽  
Philip Spadaro ◽  
Todd Thornburg ◽  
Richard Fox
Keyword(s):  
Lower Cost ◽  
Risk Mitigation ◽  
Management Strategies ◽  
Source Control ◽  
Contaminated Sediment ◽  
Practical Observation ◽  
Ecosystem Recovery ◽  
Natural Recovery ◽  
Natural Processes

Sequential risk mitigation approaches the remediation of contaminated sediments in three phases designed to: (1) immediately reduce the ecological and human health risks associated with high levels of contamination, using methods such as the confinement or capping of high-risk materials; (2) reduce the risks associated with moderate levels of pollution to a minimum, on a less urgent schedule and at a lower cost; and (3) address areas of limited contamination through a combination of natural recovery and enhanced natural recovery (to aid or speed those natural processes). Natural recovery, the reduction of contaminant concentrations through natural processes, is based on the practical observation that overall ecosystem recovery appears to be largely a function of time. Sediment decomposition and the mixing of new and old sediments by bottom-dwelling organisms can both contribute to reduced contaminant concentrations. Knowledge of these processes--sediment decomposition, sediment mixing by bottom-dwelling organisms, and chemical residence time is critical in the development of appropriate ecosystem recovery and waste management strategies. Evaluations to support natural recovery predictions are designed to collect and evaluate information necessary to determine whether surface sediment chemical concentrations, with adequate source control, will reach the cleanup standards within a ten-year period.

Demonstration and validation of enhanced monitored natural recovery at a pesticide-contaminated sediment site

2019 ◽  
Vol 20 (1) ◽  
pp. 204-219 ◽  
Author(s):  
Kyle Fetters ◽  
Gunther Rosen ◽  
Victoria Kirtay ◽  
Bart Chadwick ◽  
Jason Conder ◽  
...  
Keyword(s):  
Contaminated Sediment ◽  
Natural Recovery

Toolset for assessment of natural recovery from legacy contaminated sediment: Case study of Pallanza Bay, Lake Maggiore, Italy

2017 ◽  
Vol 121 ◽  
pp. 109-119 ◽  
Author(s):  
Diana Lin ◽  
Yeo-Myoung Cho ◽  
Amy Oen ◽  
Espen Eek ◽  
Jake P. Tommerdahl ◽  
...  
Keyword(s):  
Contaminated Sediment ◽  
Natural Recovery ◽  
Lake Maggiore

Remediation of Nitrogen-Contaminated Sediment Using Bioreactive, Thin-layer Capping with Biozeolite

2016 ◽  
Vol 25 (1) ◽  
pp. 89-100 ◽  
Author(s):  
Zhenming Zhou ◽  
Tinglin Huang ◽  
Baoling Yuan ◽  
Xiaobin Liao
Keyword(s):  
Thin Layer ◽  
Contaminated Sediment

Applications of Photoelectron Microscopy

1976 ◽  
Vol 34 ◽  
pp. 506-507
Author(s):  
William J. Baxter
Keyword(s):  
Electron Microscopy ◽  
Thermal Decomposition ◽  
Chemical Composition ◽  
Ultraviolet Radiation ◽  
Thin Layer ◽  
Edge Effects ◽  
Electron Optics ◽  
Surface Layers ◽  
Crystalline Orientation ◽  
Fluorescent Screen

In this form of electron microscopy, photoelectrons emitted from a metal by ultraviolet radiation are accelerated and imaged onto a fluorescent screen by conventional electron optics. image contrast is determined by spatial variations in the intensity of the photoemission. The dominant source of contrast is due to changes in the photoelectric work function, between surfaces of different crystalline orientation, or different chemical composition. Topographical variations produce a relatively weak contrast due to shadowing and edge effects.Since the photoelectrons originate from the surface layers (e.g. ∼5-10 nm for metals), photoelectron microscopy is surface sensitive. Thus to see the microstructure of a metal the thin layer (∼3 nm) of surface oxide must be removed, either by ion bombardment or by thermal decomposition in the vacuum of the microscope.

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