Growth and Properties of Amorphous Erbium-doped Aluminum-yttrium Oxide Films Deposited by Aerosol-UV-Assisted MOCVD

2014 ◽  
Vol 21 (1-2-3) ◽  
pp. 26-32 ◽  
Author(s):  
Rached Salhi ◽  
Carmen Jimenez ◽  
Jean-Luc Deschanvres ◽  
Ramzi Maâlej ◽  
Mohieddine Fourati
Keyword(s):  
Yttrium Oxide ◽  
Oxide Films ◽  
Erbium Doped ◽  
Aluminum Yttrium

Influence of deposition conditions on the optical properties of erbium-doped yttrium oxide films grown by aerosol–UV assisted MOCVD

2011 ◽  
Vol 131 (11) ◽  
pp. 2311-2316 ◽  
Author(s):  
Rached Salhi ◽  
Ramzi Maalej ◽  
Mohieddine Fourati ◽  
Yannick Guyot ◽  
Odette Chaix-Pluchery ◽  
...  
Keyword(s):  
Optical Properties ◽  
Yttrium Oxide ◽  
Oxide Films ◽  
Erbium Doped ◽  
Deposition Conditions

Effect of Humidity and UV Assistance on the Properties of Erbium Doped Yttrium Oxide Films Prepared by Aerosol-MOCVD

2011 ◽  
Vol 17 (4-6) ◽  
pp. 93-97 ◽  
Author(s):  
Rached Salhi ◽  
Herve Roussel ◽  
Patrick Chaudouët ◽  
Ramzi Maalej ◽  
Mohieddine Fourati ◽  
...  
Keyword(s):  
Yttrium Oxide ◽  
Oxide Films ◽  
Erbium Doped

Photoluminescence and electrical properties of erbium‐doped indium oxide films prepared by rf sputtering

1994 ◽  
Vol 76 (12) ◽  
pp. 8209-8211 ◽  
Author(s):  
Hong Koo Kim ◽  
Cheng Chung Li ◽  
Gerald Nykolak ◽  
Philippe C. Becker
Keyword(s):  
Electrical Properties ◽  
Indium Oxide ◽  
Oxide Films ◽  
Rf Sputtering ◽  
Erbium Doped ◽  
Indium Oxide Films

scholarly journals Luminescent properties of ensemble and individual erbium-doped yttrium oxide nanotubes

2009 ◽  
Vol 105 (9) ◽  
pp. 094329 ◽  
Author(s):  
Yuanbing Mao ◽  
Xia Guo ◽  
Thai Tran ◽  
Kang L. Wang ◽  
C. Ken Shih ◽  
...  
Keyword(s):  
Yttrium Oxide ◽  
Luminescent Properties ◽  
Erbium Doped

scholarly journals Formation of Aluminum Yttrium Mixed Oxide Films by Electrodeposition.

1992 ◽  
Vol 43 (7) ◽  
pp. 720-721
Author(s):  
Hidetaka KONNO ◽  
Rina SEGAWA ◽  
Isao SAEKI ◽  
Ryusaburo FURUICHI
Keyword(s):  
Mixed Oxide ◽  
Oxide Films ◽  
Aluminum Yttrium

scholarly journals Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on n-Si

2003 ◽  
Vol 94 (1) ◽  
pp. 318-325 ◽  
Author(s):  
E. K. Evangelou ◽  
C. Wiemer ◽  
M. Fanciulli ◽  
M. Sethu ◽  
W. Cranton
Keyword(s):  
Magnetron Sputtering ◽  
Yttrium Oxide ◽  
Structural Characteristics ◽  
Oxide Films ◽  
Rf Magnetron Sputtering

scholarly journals Structure and properties of zirconium oxide films doped with yttrium oxide obtained by laser deposition in vacuum

2020 ◽  
pp. 10-18
Author(s):  
Nikolai A. Bosak ◽  
Aleksandr N. Chumakov ◽  
Aleksandr A. Shevchenok ◽  
Liudmila V. Baran ◽  
Victoria V. Malutina-Bronskaya ◽  
...  
Keyword(s):  
Yttrium Oxide ◽  
Zirconium Oxide ◽  
Near Infrared ◽  
Radiation Power ◽  
Oxide Films ◽  
Surface States ◽  
Infrared Region ◽  
Laser Exposure ◽  
Glass Substrates ◽  
Middle Infrared

The thin films deposited in vacuum (2 ⋅ 10–2 mm Hg) on the silicon and glass substrates under the multi-pulse high-frequency (10 –15 kHz) laser exposure (laser radiation power density 100 MW/cm2 and the distance from the target to the substrate 40 mm) for zirconium oxide ZrO2 ceramics doped with yttrium oxide 5 % Y2O3. The morphology of the obtained films was studied using atomic force microscopy. The features of transmission spectra in the visible, near infrared and middle infrared region were revealed. The transmission of the zirconium oxide film on the silicon substrate reached 12 % in the spectral region from 1.0 to 2.5 μm, and in the region from 2.6 to 6.0 μm was 4.7 %. On a glass substrate, the transmittance at a wavelength of 643 nm was 60 %, and at a wavelength of 2500 nm it reached 87 %. In the middle infrared region, transmission at a frequency of 2548 cm–1 was 70 % and reached 75 % at a frequency of 3566 cm–1. The volt-ampere and capacitance-voltage characteristics of the obtained zirconium oxide films were characterized by non-linearity, including hysteresis, and are probably due to the presence of discrete surface states with a wide energy spectrum associated with nanoparticles and nanocrystalline film inclusions.

Erratum: Structural and Electrical Characterizations of Yttrium Oxide Films after Postannealing Treatments [J. Electrochem. Soc., 152, F217 (2005)]

2006 ◽  
Vol 153 (2) ◽  
pp. L4
Author(s):  
C. Durand ◽  
C. Dubourdieu ◽  
C. Vallée ◽  
E. Gautier ◽  
F. Ducroquet ◽  
...  
Keyword(s):  
Yttrium Oxide ◽  
Oxide Films ◽  
Electrical Characterizations
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