Diffusion Model of Saturation Current Collection by a Planar Langmuir Probe in a Strong Magnetic Field

1993 ◽  
Vol 33 (4) ◽  
pp. 241-264 ◽  
Author(s):  
M. Stanojević ◽  
M. Čerček ◽  
T. Gyergyek ◽  
N. Jelić
2021 ◽  
Vol 2064 (1) ◽  
pp. 012061
Author(s):  
A V Kaziev ◽  
D G Ageychenkov ◽  
A V Tumarkin ◽  
D V Kolodko ◽  
N S Sergeev ◽  
...  

Abstract The response of the ion current in the substrate region to the magnetic system configuration of a circular magnetron was studied during direct current sputtering of aluminum target. The unbalancing degree induced by changing of magnets’ positions was modelled with finite element methods. The ion saturation current in the substrate region showed more than twofold variation with unbalancing degree in the range 0.6–1.2. The dependence was non-monotonic, and the system was optimized to maximize the substrate ion current. The Langmuir probe diagnostics showed plasma density ~ 1016 m−3 in the optimized magnetic configuration.


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