scholarly journals All‐Optical Temperature Sensing in Organogel Matrices via Annihilation Upconversion

ChemPhotoChem ◽  
2019 ◽  
Vol 3 (10) ◽  
pp. 1020-1026 ◽  
Author(s):  
Nadzeya Nazarova ◽  
Yuri Avlasevich ◽  
Katharina Landfester ◽  
Stanislav Baluschev
ACS Omega ◽  
2021 ◽  
Author(s):  
Ernesta Heinrich ◽  
Yuri Avlasevich ◽  
Katharina Landfester ◽  
Stanislav Baluschev

2018 ◽  
Vol 30 (24) ◽  
pp. 2175-2178 ◽  
Author(s):  
Partha Mondal ◽  
Raktim Haldar ◽  
Vishwatosh Mishra ◽  
Shailendra K. Varshney

2011 ◽  
Vol 9 (5) ◽  
pp. 1948-1951 ◽  
Author(s):  
Longjiang Zhao ◽  
Lan Jiang ◽  
Sumei Wang ◽  
Hai Xiao ◽  
Yongfeng Lu ◽  
...  

Author(s):  
R. Hegerl ◽  
A. Feltynowski ◽  
B. Grill

Till now correlation functions have been used in electron microscopy for two purposes: a) to find the common origin of two micrographs representing the same object, b) to check the optical parameters e. g. the focus. There is a third possibility of application, if all optical parameters are constant during a series of exposures. In this case all differences between the micrographs can only be caused by different noise distributions and by modifications of the object induced by radiation.Because of the electron noise, a discrete bright field image can be considered as a stochastic series Pm,where i denotes the number of the image and m (m = 1,.., M) the image element. Assuming a stable object, the expectation value of Pm would be Ηm for all images. The electron noise can be introduced by addition of stationary, mutual independent random variables nm with zero expectation and the variance. It is possible to treat the modifications of the object as a noise, too.


1988 ◽  
Vol 49 (C2) ◽  
pp. C2-459-C2-462 ◽  
Author(s):  
F. A.P. TOOLEY ◽  
B. S. WHERRETT ◽  
N. C. CRAFT ◽  
M. R. TAGHIZADEH ◽  
J. F. SNOWDON ◽  
...  
Keyword(s):  

1997 ◽  
Vol 503 ◽  
Author(s):  
Yongxia Zhang ◽  
Yanwei Zhang ◽  
Juliana Blaser ◽  
T. S. Sriiram ◽  
R. B. Marcus

ABSTRACTA thermal microprobe has been designed and built for high resolution temperature sensing. The thermal sensor is a thin-film thermocouple junction at the tip of an Atomic Force Microprobe (AFM) silicon probe needle. Only wafer-stage processing steps are used for the fabrication. The thermal response over the range 25–s 4.5–rovolts per degree C and is linear.


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