ChemInform Abstract: Doping Effects of Group-IIIA Elements on Physical Properties of ZnMgXO (X: Al, Ga, In, Tl) Transparent Conducting Oxide Films Prepared by RF Magnetron Sputtering.

ChemInform ◽  
2014 ◽  
Vol 45 (48) ◽  
pp. no-no
Author(s):  
Sang-Hun Jeong ◽  
Jang-Ho Park ◽  
Byung-Teak Lee
Keyword(s):  
Magnetron Sputtering ◽  
Physical Properties ◽  
Transparent Conducting Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Transparent Conducting ◽  
Doping Effects

Microstructure and Electrical Properties of AZO Films Prepared by RF Magnetron Sputtering

2011 ◽  
Vol 264-265 ◽  
pp. 754-759 ◽  
Author(s):  
Bakri Jufriadi ◽  
Agus Geter E. Sutjipto ◽  
R. Othman ◽  
R. Muhida
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Time ◽  
Transparent Conducting Oxide ◽  
Rf Magnetron Sputtering ◽  
Flat Panel Displays ◽  
Emi Shielding ◽  
Transparent Conducting ◽  
Deposition Processes ◽  
Electro Magnetic ◽  
Static Discharge

AZO is an ideal replacement transparent conducting oxide (TCO) for ITO to all corresponding applications. The typical applications include: transparent electrodes for solar cells, flat panel displays, LCD electrodes, electro-magnetic compatibility (RF-EMI shielding) coatings, touch panel transparent contacts, static discharge dissipation. The production of useful and commercially attractive thin films using different deposition processes is very important parameter to investigate. A systematic study of the sputtering condition and their influenced on electrical and structural were studied. In this work, AZO films were deposited by RF magnetron sputtering at 200 °C. The result shows that the deposited time has influenced the characteristic of deposited AZO films. For a longer deposition time, thin film shows a uniform grain growth. The resistivity found minimum at the deposition time of 45 minutes. It can be considered that by reducing of the grain boundaries which enable the electron carries to conduct smoothly.

Transparent conducting zirconium-doped zinc oxide films prepared by rf magnetron sputtering

2005 ◽  
Vol 252 (5) ◽  
pp. 2006-2011 ◽  
Author(s):  
Maoshui Lv ◽  
Xianwu Xiu ◽  
Zhiyong Pang ◽  
Ying Dai ◽  
Shenghao Han
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Zinc Oxide Films ◽  
Transparent Conducting
Sign in / Sign up

Export Citation Format

Share Document