ChemInform Abstract: Ferrocenyl Derivatives with One, Two, or Three Sulfur-Containing Arms for Self-Assembled Monolayer Formation.

ChemInform ◽  
2010 ◽  
Vol 31 (31) ◽  
pp. no-no
Author(s):  
Jian Hu ◽  
Daniell Lewis Mattern
Keyword(s):  
Self Assembled Monolayer ◽  
Monolayer Formation ◽  
Self Assembled ◽  
Sulfur Containing

Real-Time Detection of Self-Assembled Monolayer Formation Using CMOS-Based Nanocapacitor Arrays

2021 ◽  
Vol MA2021-02 (57) ◽  
pp. 1941-1941
Author(s):  
Selvaraj Chinnathambi ◽  
Mohammad Saghafi ◽  
Frans Widdershoven ◽  
Serge G Lemay
Keyword(s):  
Real Time ◽  
Self Assembled Monolayer ◽  
Monolayer Formation ◽  
Real Time Detection ◽  
Self Assembled

Alkylsiloxane self-assembled monolayer formation guided by nanoimprinted Si and SiO2 templates

2006 ◽  
Vol 89 (15) ◽  
pp. 153121 ◽  
Author(s):  
Amir A. Yasseri ◽  
Shashank Sharma ◽  
Theodore I. Kamins ◽  
Qiangfei Xia ◽  
Stephen Y. Chou ◽  
...  
Keyword(s):  
Self Assembled Monolayer ◽  
Monolayer Formation ◽  
Self Assembled

Small Size Limit to Self-Assembled Monolayer Formation on Gold(111)

2011 ◽  
Vol 115 (27) ◽  
pp. 13193-13199 ◽  
Author(s):  
Joyanta K. Saha ◽  
Yoonho Ahn ◽  
Hyojeong Kim ◽  
George C. Schatz ◽  
Joonkyung Jang
Keyword(s):  
Self Assembled Monolayer ◽  
Monolayer Formation ◽  
Size Limit ◽  
Self Assembled

Self-assembled monolayer formation of a (N5)Fe(ii) complex on gold electrodes: electrochemical properties and coordination chemistry on a surface

2016 ◽  
Vol 45 (47) ◽  
pp. 19053-19061 ◽  
Author(s):  
Charlotte Buron ◽  
Sihem Groni ◽  
Nathalie Ségaud ◽  
Sandra Mazerat ◽  
Diana Dragoe ◽  
...  
Keyword(s):  
Coordination Chemistry ◽  
Electrochemical Properties ◽  
Coordination Sphere ◽  
Gold Electrode ◽  
Gold Electrodes ◽  
Self Assembled Monolayer ◽  
Monolayer Formation ◽  
Self Assembled

The first coordination sphere of (N5)FeII–X complexes grafted on a gold electrode can be tuned in a similar way to that in solution.

Photolithography of self-assembled monolayers: optimization of protecting groups by an electroanalytical method

1996 ◽  
Vol 74 (12) ◽  
pp. 2509-2517 ◽  
Author(s):  
Jamila Jennane ◽  
Tanya Boutros ◽  
Richard Giasson
Keyword(s):  
Quantitative Information ◽  
Protecting Groups ◽  
Self Assembled Monolayers ◽  
Amino Groups ◽  
Self Assembled Monolayer ◽  
Monolayer Formation ◽  
Photolabile Protecting Groups ◽  
Assembled Monolayers ◽  
Electroanalytical Method ◽  
Self Assembled

Patterned surfaces presenting a high density of chemically reactive functional groups can be prepared through photolithography of self-assembled monolayers (SAM). In this paper, we report the synthesis and the evaluation of three reagents that can be used in SAM-photolithographic applications. These reagents are made up of a triethoxysilylpropylamine moiety in which the amine is temporarily blocked by photolabile protecting groups: NVOC (o-nitroveratryloxycarbonyl), ONB (o-nitrobenzyl), or DDZ (α,α-dimethyl-3,5-dimethoxybenzyloxycarbonyl). The presence of the triethoxysilyl group allows self-assembled monolayer formation. Release of chemically reactive amino groups is achieved by irradiation of the surface. An electroanalytical method was developed and used to monitor and optimize the three steps of the methodology occurring on surfaces: monolayer formation, photodeprotection, and subsequent functionalization of the released amino groups. Quantitative information on the efficiency of the photodeprotection step was obtained by this method. It was found that the DDZ group is superior to the ONB and NVOC photolabile protecting groups for SAM-photolithographic applications. Percentages of liberated amino groups are generally above 50% with the DDZ group, while they are generally inferior to 25% and 2% for NVOC and ONB, respectively. These differences are attributed to the destruction of some of the released amino groups through a subsequent reaction with the photoproduct, o-nitrosobenzaldehyde for ONB and 3,4-dimethoxy-6-nitrosobenzaldehyde for NVOC, and to partial loss or destruction of the monolayer during prolonged irradiations. Key words: self-assembled monolayers, surface modification, photolithography, photolabile protecting groups, cyclic voltammetry.

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