scholarly journals Tunable Supramolecular Gel Properties by Varying Thermal History

2019 ◽  
Vol 25 (33) ◽  
pp. 7881-7887 ◽  
Author(s):  
Sisir Debnath ◽  
Sangita Roy ◽  
Yousef M. Abul‐Haija ◽  
Pim W. J. M. Frederix ◽  
Susana M. Ramalhete ◽  
...  
2009 ◽  
Vol 1 (6) ◽  
pp. 437-442 ◽  
Author(s):  
Gareth O. Lloyd ◽  
Jonathan W. Steed

2016 ◽  
Vol 52 (23) ◽  
pp. 4298-4300 ◽  
Author(s):  
Maria Galini Faidra Angelerou ◽  
Akmal Sabri ◽  
Rhiannon Creasey ◽  
Polyxeni Angelerou ◽  
Maria Marlow ◽  
...  

Surface properties directly affect fibre architecture and stiffness of self-assembled cytidine based gel films.


2017 ◽  
Vol 29 (13) ◽  
pp. 1605227 ◽  
Author(s):  
Michael A. Ramin ◽  
Kotagudda Ranganath Sindhu ◽  
Ananda Appavoo ◽  
Khalid Oumzil ◽  
Mark W. Grinstaff ◽  
...  

Soft Matter ◽  
2018 ◽  
Vol 14 (32) ◽  
pp. 6716-6727 ◽  
Author(s):  
Alexandre R. Meyer ◽  
Caroline R. Bender ◽  
Daniel M. dos Santos ◽  
Francieli I. Ziembowicz ◽  
Clarissa P. Frizzo ◽  
...  

The effect of slight structural changes on several supramolecular gel properties were evaluated by the test tube method, UV-Vis, 1H NMR, rheology and DSC experiments.


Author(s):  
J. R. Michael ◽  
A. D. Romig ◽  
D. R. Frear

Al with additions of Cu is commonly used as the conductor metallizations for integrated circuits, the Cu being added since it improves resistance to electromigration failure. As linewidths decrease to submicrometer dimensions, the current density carried by the interconnect increases dramatically and the probability of electromigration failure increases. To increase the robustness of the interconnect lines to this failure mode, an understanding of the mechanism by which Cu improves resistance to electromigration is needed. A number of theories have been proposed to account for role of Cu on electromigration behavior and many of the theories are dependent of the elemental Cu distribution in the interconnect line. However, there is an incomplete understanding of the distribution of Cu within the Al interconnect as a function of thermal history. In order to understand the role of Cu in reducing electromigration failures better, it is important to characterize the Cu distribution within the microstructure of the Al-Cu metallization.


1988 ◽  
Author(s):  
G.A. Desborough ◽  
F.G. Poole ◽  
A.G. Harris ◽  
T.A. Daws

Author(s):  
Petr Jirman ◽  
Marek Goldbach ◽  
Eva Geršlová
Keyword(s):  

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