Mechanistic Studies on the Gas-Phase Dehydrogenation of Alkanes at Cyclometalated Platinum Complexes

2012 ◽  
Vol 18 (44) ◽  
pp. 14055-14062 ◽  
Author(s):  
Burkhard Butschke ◽  
Helmut Schwarz
1988 ◽  
Vol 110 (9) ◽  
pp. 2714-2722 ◽  
Author(s):  
William. Tumas ◽  
Robert F. Foster ◽  
John I. Brauman

2014 ◽  
Vol 10 ◽  
pp. 2027-2037 ◽  
Author(s):  
J Alexander Willms ◽  
Rita Beel ◽  
Martin L Schmidt ◽  
Christian Mundt ◽  
Marianne Engeser

A new 4-hydroxy-L-proline derivative with a charged 1-ethylpyridinium-4-phenoxy substituent has been synthesized with the aim of facilitating mechanistic studies of proline-catalyzed reactions by ESI mass spectrometry. The charged residue ensures a strongly enhanced ESI response compared to neutral unmodified proline. The connection by a rigid linker fixes the position of the charge tag far away from the catalytic center in order to avoid unwanted interactions. The use of a charged catalyst leads to significantly enhanced ESI signal abundances for every catalyst-derived species which are the ones of highest interest present in a reacting solution. The new charged proline catalyst has been tested in the direct asymmetric inverse aldol reaction between aldehydes and diethyl ketomalonate. Two intermediates in accordance with the List–Houk mechanism for enamine catalysis have been detected and characterized by gas-phase fragmentation. In addition, their temporal evolution has been followed using a microreactor continuous-flow technique.


1986 ◽  
Vol 75 ◽  
Author(s):  
Gary L. Loper ◽  
Martin D. Tabat

AbstractUltraviolet laser-induced, radical-etching processes developed by us can provide practical etch rates and selectivities for most of the important film layer combinations used in silicon microelectronic devices. These processes have been demonstrated in simple proximity and projection exposure experiments to produce etch features on surfaces with dimensions of a few tenths of a micrometer.Mechanistic studies suggest that, in our etching processes for polysilicon and molybdenum, fluorine atoms responsible for etching are primarily produced from the precursors COF2 and NF3 on the surface rather than in the gas phase. The predominant production process appears to be photodecomposition of surface adsorbed precursor. Contributions due to precursor pyrolysis or precursor reaction with photogenerated charge carriers are found to be unimportant.


1992 ◽  
Vol 27 ◽  
pp. 251-256 ◽  
Author(s):  
G. Oberdörster ◽  
J. Ferin ◽  
J. Finkelstein ◽  
S. Soderholm

2008 ◽  
Vol 256 (2) ◽  
pp. 215-225 ◽  
Author(s):  
N BALLARINI ◽  
F CAVANI ◽  
L MASELLI ◽  
S PASSERI ◽  
S ROVINETTI

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