The effect of high-temperature annealing on optical properties of porous anodic alumina formed in oxalic acid

Luminescence ◽  
2007 ◽  
Vol 22 (4) ◽  
pp. 355-361 ◽  
Author(s):  
Zhaojian Li ◽  
Kelong Huang
Keyword(s):  
Optical Properties ◽  
High Temperature ◽  
Oxalic Acid ◽  
Anodic Alumina ◽  
Porous Anodic Alumina ◽  
High Temperature Annealing

The effect of the voltage waveform on the microstructure and optical properties of porous anodic alumina photonic crystals

2019 ◽  
Vol 98 ◽  
pp. 109488 ◽  
Author(s):  
Shiyuan Zhang ◽  
Qin Xu ◽  
Shunzhen Feng ◽  
Chunxin Sun ◽  
Qi Peng ◽  
...  
Keyword(s):  
Optical Properties ◽  
Photonic Crystals ◽  
Anodic Alumina ◽  
Porous Anodic Alumina ◽  
Voltage Waveform

Annealing behaviors of structural, interfacial and optical properties of HfO2 thin films prepared by plasma assisted reactive pulsed laser deposition

2010 ◽  
Vol 25 (4) ◽  
pp. 680-686 ◽  
Author(s):  
Zhifeng Ying ◽  
Wentao Tang ◽  
Zhigao Hu ◽  
Wenwu Li ◽  
Jian Sun ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Optical Properties ◽  
High Temperature ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
High Temperature Annealing ◽  
Good Thermal Stability ◽  
Transmission Measurements ◽  
Deposited Films

The structure and properties of HfO2 films deposited by plasma assisted reactive pulsed laser deposition and annealed in N2 were studied upon thermal annealing as well as the evaluation of thermal stability by Fourier transform infrared spectroscopy, spectroscopic ellipsometry, and optical transmission measurements. The as-deposited HfO2 films appear predominantly monoclinic with an amorphous matrix which becomes crystallized after high-temperature annealing. No interfacial SiOx is observed for the as-deposited films on Si. The deposited HfO2 films exhibit good thermal stability and show excellent transparency in a wide spectral range with optical band gap energies of 5.65–5.73 eV depending on annealing temperature. An improvement in the optical properties by high-temperature annealing is also observed.

Light emission from silicon-based porous anodic alumina formed in 0.5 M oxalic acid

2003 ◽  
Vol 94 (4) ◽  
pp. 2407-2410 ◽  
Author(s):  
G. S. Huang ◽  
X. L. Wu ◽  
Y. Xie ◽  
X. F. Shao ◽  
S. H. Wang
Keyword(s):  
Oxalic Acid ◽  
Light Emission ◽  
Anodic Alumina ◽  
Porous Anodic Alumina ◽  
Silicon Based

Influence of Al substrate on the optical properties of porous anodic alumina films

2012 ◽  
Vol 74 ◽  
pp. 137-139 ◽  
Author(s):  
Qin Xu ◽  
Yuhua Yang ◽  
Jianjun Gu ◽  
Ziyue Li ◽  
Huiyuan Sun
Keyword(s):  
Optical Properties ◽  
Anodic Alumina ◽  
Porous Anodic Alumina ◽  
Alumina Films

scholarly journals A Novel Method for Fabricating Double Layers Porous Anodic Alumina in Phosphoric/Oxalic Acid Solution and Oxalic Acid Solution

2016 ◽  
Vol 2016 ◽  
pp. 1-6 ◽  
Author(s):  
Yanfang Xu ◽  
Xiaojiu Li ◽  
Hao Liu ◽  
Jie Xu
Keyword(s):  
Oxalic Acid ◽  
Acid Solution ◽  
Oxalic Acid Solution ◽  
Anodic Alumina ◽  
Porous Anodic Alumina ◽  
Double Layers ◽  
Pore Density ◽  
Interpore Distance ◽  
Small Pore ◽  
Novel Method

A novel method for fabricating ordered double layers porous anodic alumina (DL-PAA) with controllable nanopore size was presented. Highly ordered large pore layer with interpore distance of 480 nm was fabricated in phosphoric acid solution with oxalic acid addition at the potential of 195 V and the small pore layer was fabricated in oxalic acid solution at the potential from 60 to 100 V. Experimental results show that the thickness of large pore layer is linearly correlative with anodizing time, and pore diameter is linearly correlative with pore widening time. When the anodizing potential in oxalic acid solution was adjusted from 60 to 100 V, the small pore layers with continuously tunable interpore distance from 142 to 241 nm and pore density from1.94×109to4.89×109 cm−2were obtained. And the interpore distance and the pore density of small pore layers are closely correlative with the anodizing potential. The fabricated DL-PAA templates can be widely utilized for fabrication of ordered nanomaterials, such as superhydrophobic or gecko-inspired adhesive materials and metal or semiconductor nanowires.

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