New copper phthalocyanine oligomers for high dielectric constant polymer films

2010 ◽  
Vol 117 (1) ◽  
pp. 122-128 ◽  
Author(s):  
Rituparna Saha ◽  
Braja K. Mandal
Keyword(s):  
Dielectric Constant ◽  
Polymer Films ◽  
High Dielectric Constant ◽  
Copper Phthalocyanine ◽  
High Dielectric

Reply to the ‘Comment on “Synthesis and properties of a high dielectric constant copolymer of a copper phthalocyanine oligomer grafted to amino-capped polyimide”’ by G. Mezei, Journal of Materials Chemistry C, 2019, 7, DOI: 10.1039/C8TC04076A

2019 ◽  
Vol 7 (16) ◽  
pp. 4892-4894
Author(s):  
Linlin Chen ◽  
Yichun Ding ◽  
Haoqing Hou
Keyword(s):  
Dielectric Constant ◽  
Chemical Structure ◽  
High Dielectric Constant ◽  
Copper Phthalocyanine ◽  
Materials Chemistry ◽  
High Dielectric

We reply to the comment raised by Gellert Mezei on our paper regarding the exact chemical structure of the synthesized copper phthalocyanine oligomer (o-CuPc).

Application of a Buffer Layer for the Dielectric Measurement of Thin Polymer Films

2001 ◽  
Vol 699 ◽  
Author(s):  
C. K. Chiang ◽  
Wataru Sakai
Keyword(s):  
Dielectric Constant ◽  
Buffer Layer ◽  
Polymer Films ◽  
Measurement Method ◽  
High Dielectric Constant ◽  
Electrical Characterization ◽  
Dielectric Measurement ◽  
Buffer Layers ◽  
Dielectric Constant Measurement ◽  
High Dielectric

AbstractA buffered dielectric measurement method is described. We added a thin buffer polymer layer to a polymer film before depositing aluminum electrodes. This is a modification to conventional parallel plate dielectric constant measurement method. It still has well-defined geometric factor for determining the dielectric constant. We designed the buffer layer using a simple RC model. It was determined that the buffer layer should be a high dielectric constant polymer. Two high dielectric constant polymers were selected to be buffer layers. Layered samples with structures ABA and ABC were discussed, where A is the buffer layer. We show that the method not only provides a way to preserve the structure of special polymer films, but also is able to adjust its electrical characterization to a convenient level.

Synthesis and properties of a high dielectric constant copolymer of a copper phthalocyanine oligomer grafted to amino-capped polyimide

2017 ◽  
Vol 5 (33) ◽  
pp. 8371-8375 ◽  
Author(s):  
Linlin Chen ◽  
Yichun Ding ◽  
Ting Yang ◽  
Changfeng Wan ◽  
Haoqing Hou
Keyword(s):  
Dielectric Constant ◽  
Thermal Treatment ◽  
Polymer Film ◽  
High Dielectric Constant ◽  
Copper Phthalocyanine ◽  
Organic Polymer ◽  
Polyamic Acid ◽  
High Dielectric

A novel high dielectric constant all-organic polymer film of a copper phthalocyanine oligomer grafted to polyimide (CuPc–PI) was successfully synthesized via a polycondensation between a copper phthalocyanine anhydride oligomer and amino-capped polyamic acid, followed by thermal treatment.

Nanostructures and dielectric properties of PVDF-based polymer films with high energy density and low energy losses

2015 ◽  
Vol 1740 ◽  
Author(s):  
Masahiko Ando ◽  
Naoki Yoshimoto ◽  
Yuichiro Yoshitake ◽  
Shuji Kato ◽  
Hidekazu Kodama ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Dielectric Loss ◽  
Polymer Films ◽  
Polyvinylidene Fluoride ◽  
High Dielectric Constant ◽  
Electrical Energy ◽  
High Energy ◽  
High Energy Density ◽  
Β Phase ◽  
High Dielectric

ABSTRACTBased on the investigation of mechanism for large dielectric losses in relaxor fluorinated polymers, polyvinylidene fluoride (PVDF) derivatives, a new nanostructure-controlled PVDF based polymer films with low dielectric loss, tanδ < 1% (0.6%), and high dielectric constant, εr = 13 at frequency of 1 kHz, was proposed for electrical energy storage applications. The high dielectric loss was mainly due to the electric-field induced α-β phase transition, and one dimensional extension of P(VDF-TrFE)-g-PEMA films was found to reduce the α phase component resulting in reduction of the dielectric loss while keeping the high dielectric constant. In-situ FTIR measurements suggested a possibility of further reducing the dielectric-loss.

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