On‐Wafer Crystallization of Ultralow‐κPure Silica Zeolite Films

2009 ◽  
Vol 121 (26) ◽  
pp. 4871-4874 ◽  
Author(s):  
Yan Liu ◽  
Christopher M. Lew ◽  
Minwei Sun ◽  
Rui Cai ◽  
Junlan Wang ◽  
...  
Keyword(s):  
Pure Silica ◽  
Zeolite Films

Pure Silica Zeolite Films Prepared by a Vapor Phase Transport Method

2008 ◽  
Vol 47 (11) ◽  
pp. 8360-8363 ◽  
Author(s):  
Yoshinori Cho ◽  
Toshiki Seo ◽  
Kazuo Kohmura ◽  
Takamaro Kikkawa
Keyword(s):  
Vapor Phase ◽  
Vapor Phase Transport ◽  
Pure Silica ◽  
Vapor Phase Transport Method ◽  
Zeolite Films ◽  
Phase Transport ◽  
Transport Method

Effects of Silylation on Electrical and Mechanical Characteristics of Mesoporous Pure Silica Zeolite Films

2007 ◽  
Author(s):  
T. Seo ◽  
T. Yoshino ◽  
N. Ohnuki ◽  
Y. Seino ◽  
N. Hata ◽  
...  
Keyword(s):  
Mechanical Characteristics ◽  
Pure Silica ◽  
Zeolite Films

Insight into On-Wafer Crystallization of Pure-Silica-Zeolite Films through Nutrient Replenishment

Langmuir ◽  
2011 ◽  
Vol 27 (7) ◽  
pp. 3283-3285 ◽  
Author(s):  
Christopher M. Lew ◽  
Yan Liu ◽  
David Kisailus ◽  
Grant M. Kloster ◽  
Gabriel Chow ◽  
...  
Keyword(s):  
Pure Silica ◽  
Nutrient Replenishment ◽  
Zeolite Films ◽  
Insight Into

Pure Silica Zeolite Films as Low-k Dielectrics by Spin-On of Nanoparticle Suspensions

2001 ◽  
Vol 13 (19) ◽  
pp. 1463-1466 ◽  
Author(s):  
Z. B. Wang ◽  
A. Mitra ◽  
H. T. Wang ◽  
L. M. Huang ◽  
Y. Yan
Keyword(s):  
Pure Silica ◽  
Nanoparticle Suspensions ◽  
Zeolite Films ◽  
Low K

scholarly journals Enhancing Formaldehyde Selectivity of SnO2 Gas Sensors with the ZSM-5 Modified Layers

Sensors ◽  
2021 ◽  
Vol 21 (12) ◽  
pp. 3947
Author(s):  
Wei Wang ◽  
Qinyi Zhang ◽  
Ruonan Lv ◽  
Dong Wu ◽  
Shunping Zhang
Keyword(s):  
Gas Sensors ◽  
Indoor Air ◽  
High Performance ◽  
Screen Printing ◽  
Gas Sensing ◽  
Oxide Semiconductors ◽  
Screen Printing Method ◽  
Gas Sensing Properties ◽  
Zeolite Films ◽  
Insufficient Knowledge

High performance formaldehyde gas sensors are widely needed for indoor air quality monitoring. A modified layer of zeolite on the surface of metal oxide semiconductors results in selectivity improvement to formaldehyde as gas sensors. However, there is insufficient knowledge on how the thickness of the zeolite layer affects the gas sensing properties. In this paper, ZSM-5 zeolite films were coated on the surface of the SnO2 gas sensors by the screen printing method. The thickness of ZSM-5 zeolite films was controlled by adjusting the numbers of screen printing layers. The influence of ZSM-5 film thickness on the performance of ZSM-5/SnO2 gas sensors was studied. The results showed that the ZSM-5/SnO2 gas sensors with a thickness of 19.5 μm greatly improved the selectivity to formaldehyde, and reduced the response to ethanol, acetone and benzene at 350 °C. The mechanism of the selectivity improvement to formaldehyde of the sensors was discussed.

Palladium confined in pure-silica TON zeolite for furfuryl alcohol hydrogenation into tetrahydrofurfuryl alcohol

2021 ◽  
pp. 111161
Author(s):  
Jingmin Lan ◽  
Peiwen Liu ◽  
Ping Fu ◽  
Xiaoling Liu ◽  
Menglin Xie ◽  
...  
Keyword(s):  
Furfuryl Alcohol ◽  
Pure Silica

Micro-Ribbons and Micro-Wires Silica Synthesis Using Bottom-Top Technique

2020 ◽  
Vol 1008 ◽  
pp. 33-38
Author(s):  
Marwa Nabil ◽  
Hussien A. Motaweh
Keyword(s):  
Selection Process ◽  
Chemical Properties ◽  
Industrial Applications ◽  
Preparation Process ◽  
Pure Silica ◽  
One Step ◽  
Materials Used ◽  
Sonication Technique ◽  
Silica Synthesis ◽  
Physical And Chemical

Silica is one of the most important materials used in many industries. The basic factor on which the selection process depends is the structural form, which is dependent on the various physical and chemical properties. One of the common methods in preparing pure silica is that it needs more than one stage to ensure the preparation process completion. The goal of this research is studying the nucleation technique (Bottom-top) for micro-wires and micro-ribbons silica synthesis. The silica nanoand microstructures are prepared using a duality (one step); a combination of alkali chemical etching process {potassium hydroxide (3 wt %) and n-propanol (30 Vol %)} and the ultra-sonication technique. In addition, the used materials in the preparation process are environmentally friendly materials that produce no harmful residues. The powder product is characterized using XRD, FTIR, Raman spectrum and SEM for determining the shape of architectures. The most significant factor of the nucleation mechanism is the sonication time of silica powder production during the dual technique. The product stages are as follows; silica nanoparticles (21-38 nm), nanoclusters silica (46 – 67 nm), micro-wires silica (1.17 – 6.29 μm), and micro-ribbons silica (19.4 – 54.1 μm). It's allowing for use in environmental applications (multiple wastewater purification, multiple uses in air filters, as well as many industrial applications).

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