Poly(3,4‐Ethylenedioxythiophene): Methylnaphthalene Sulfonate Formaldehyde Condensate: The Effect of Work Function and Structural Homogeneity on Hole Injection/Extraction Properties

2016 ◽  
Vol 7 (6) ◽  
pp. 1601499 ◽  
Author(s):  
Yuda Li ◽  
Meiyue Liu ◽  
Yuan Li ◽  
Kai Yuan ◽  
Lijia Xu ◽  
...  
2019 ◽  
Vol 30 (5) ◽  
pp. 1907265 ◽  
Author(s):  
Jian Lin ◽  
Xingliang Dai ◽  
Xiaoyong Liang ◽  
Desui Chen ◽  
Xuerong Zheng ◽  
...  

2006 ◽  
Vol 37 (1) ◽  
pp. 49 ◽  
Author(s):  
Che-H. Hsua ◽  
Yulong Shen ◽  
Eric M. Smith ◽  
Dan D. LeCloux ◽  
Hjalti Skulason ◽  
...  

2011 ◽  
Vol 50 (1S2) ◽  
pp. 01BB01 ◽  
Author(s):  
Seong-Ho Kim ◽  
Hanae Otsuka ◽  
Hyea-Weon Shin ◽  
Kuniaki Tanaka ◽  
Rigoberto C. Advincula ◽  
...  

2011 ◽  
Vol 89 (12) ◽  
pp. 1512-1518 ◽  
Author(s):  
Christophe Blaszykowski ◽  
Larissa-Emilia Cheran ◽  
Michael Thompson

In molecular optoelectronics, high-quality contacts at electrode|organics interfaces are crucial for charge carriers to efficiently flow through and therefore play a critical role on device performance. Electrode surface morphology, adhesibility, wettability, and work function are thus many parameters that must be accurately controlled, which is achievable using self-assembling monolayer (SAM) surface chemistry. Herein, we employ this technique to alter the electronic and surface energy-related properties of indium–tin oxide (ITO). In comparison to unmodified ITO, the newly introduced SAM-derivatized surface exhibits limited wettability and considerably higher work function (ΔΦ = ~1.2 eV). Several applications are proposed for this organic coating, notably at the anode of organic light-emitting diode (OLED) devices for decreasing the hole injection barrier or as an atmospherically stable protective layer in the coatings industry.


2011 ◽  
Vol 123 (28) ◽  
pp. 6398-6401 ◽  
Author(s):  
Mi-Ri Choi ◽  
Tae-Hee Han ◽  
Kyung-Geun Lim ◽  
Seong-Hoon Woo ◽  
Dal Ho Huh ◽  
...  

2004 ◽  
Vol 108 (49) ◽  
pp. 18949-18955 ◽  
Author(s):  
Akira Baba ◽  
Ken Onishi ◽  
Wolfgang Knoll ◽  
Rigoberto C. Advincula

Sign in / Sign up

Export Citation Format

Share Document