Plasmonic Antennas: Large-Area Antenna-Assisted SEIRA Substrates by Laser Interference Lithography (Advanced Optical Materials 11/2014)

2014 ◽  
Vol 2 (11) ◽  
pp. 1049-1049
Author(s):  
Shahin Bagheri ◽  
Harald Giessen ◽  
Frank Neubrech
Keyword(s):  
Optical Materials ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area

Large-area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

2004 ◽  
Vol 15 (5) ◽  
pp. 639-642 ◽  
Author(s):  
L Prodan ◽  
T G Euser ◽  
H A G M van Wolferen ◽  
C Bostan ◽  
R M de Ridder ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Infrared Light ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Two Dimensional ◽  
Laser Interference ◽  
Large Area ◽  
Silicon Photonic

scholarly journals The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

Nanomaterials ◽  
2019 ◽  
Vol 9 (1) ◽  
pp. 73 ◽  
Author(s):  
Jun Wu ◽  
Zhaoxin Geng ◽  
Yiyang Xie ◽  
Zhiyuan Fan ◽  
Yue Su ◽  
...  
Keyword(s):  
Indium Tin Oxide ◽  
Splitting Method ◽  
Vertical Direction ◽  
Interference Lithography ◽  
Wearable Electronics ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area ◽  
Periodic Nanostructures ◽  
Ito Glass

We report a method for fabricating periodic nanostructures on the surface of polydimethylsiloxane (PDMS) using laser interference lithography. The wave-front splitting method was used for the system, as the period and duty cycle can be easily controlled. Indium tin oxide (ITO) glass reveals favorable characteristics for controlling the standing waves distributed in the vertical direction, and was selected as the rigid substrate for the curing of the PDMS prepolymer, photoresist spin coating, and exposure processes. Periodic nanostructures such as gratings, dot, and hole arrays were prepared. This efficient way of fabricating large area periodic nanoscale patterns will be useful for surface plasmonic resonance and wearable electronics.

Large area metal micro-/nano-groove arrays with both structural color and anisotropic wetting fabricated by one-step focused laser interference lithography

Nanoscale ◽  
2019 ◽  
Vol 11 (11) ◽  
pp. 4803-4810 ◽  
Author(s):  
Hao Wu ◽  
Yunlong Jiao ◽  
Chenchu Zhang ◽  
Chao Chen ◽  
Liang Yang ◽  
...  
Keyword(s):  
Metal Surfaces ◽  
Structural Color ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area ◽  
One Step

Colorful and anisotropic multi-functional metal surfaces fabricated by focused laser interference lithography.

Fabrication of large-area periodic nanostructures using two-mirror laser interference lithography

2013 ◽  
Vol 9 (6) ◽  
pp. 879-882 ◽  
Author(s):  
Jongseok Kim ◽  
Il Gyu Jeong ◽  
Sang Ho Lee ◽  
Kyung Tae Kang ◽  
Sung Ho Lee
Keyword(s):  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area ◽  
Periodic Nanostructures

scholarly journals Large-Area Printed Broadband Membrane Reflectors by Laser Interference Lithography

2013 ◽  
Vol 5 (1) ◽  
pp. 2200106-2200106 ◽  
Author(s):  
Jung-Hun Seo ◽  
Jungho Park ◽  
Deyin Zhao ◽  
Hongjun Yang ◽  
Weidong Zhou ◽  
...  
Keyword(s):  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area

Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference Lithography

2013 ◽  
Vol 815 ◽  
pp. 457-464
Author(s):  
Hang Yu ◽  
Bing Rui Lu ◽  
Hui Li ◽  
Jian Ying Li ◽  
Ran Liu
Keyword(s):  
Periodic Structures ◽  
Low Cost ◽  
Substrate Surface ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area ◽  
Complex Processes ◽  
Submicron Scale ◽  
Potential Applications

The fabrication of large area nanoscale periodic structures on material surfaces for hydrophobicity engineering has been difficult due to the complex processes. Here we propose a two-step fabrication method for periodic nanostructures by combining laser interference lithography (LIL) and reactive ion etching (RIE). Sub-micron periodic nanotip patterns are fabricated in the photoresist by LIL, and then transferred into the silicon substrate using RIE. By measuring the contact angle (CA) of a water droplet on the substrate surface, the wettability of the surface with nanotip structures of various periods is studied. Our experiments show that the nanotip structures fabricated by the combined LIL and RIE process deliver satisfactory hydrophobic tendencies when the periods fall into the submicron scale. When the period of the structure is small enough, the hydrophilicity of the surface can be altered into hydrophobicity. The hydrophobicity achieved by this method is reusable and sustainable with low cost and no composition alteration comparing to chemical methods. The process developed in this work provides potential applications in biosensingand digital fluidics.

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