Tailored Star Block Copolymer Architecture for High Performance Chemically Amplified Resists

2012 ◽  
Vol 24 (44) ◽  
pp. 5939-5944 ◽  
Author(s):  
Florian Wieberger ◽  
Christian Neuber ◽  
Christopher K. Ober ◽  
Hans-Werner Schmidt
Keyword(s):  
Block Copolymer ◽  
High Performance ◽  
Star Block Copolymer ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

scholarly journals Gadolinium-conjugated star-block copolymer polylysine-modified polyethylenimine as high-performance T1 MR imaging blood pool contrast agents

RSC Advances ◽  
2018 ◽  
Vol 8 (9) ◽  
pp. 5005-5012 ◽  
Author(s):  
Zhongjie Huang ◽  
Yicun Chen ◽  
Daojun Liu ◽  
Chao Lu ◽  
Zhiwei Shen ◽  
...  
Keyword(s):  
Surface Modification ◽  
Block Copolymer ◽  
Mr Imaging ◽  
Contrast Agents ◽  
High Performance ◽  
Blood Pool ◽  
Core Shell ◽  
Star Block Copolymer ◽  
Blood Pool Contrast Agents

Core–shell copolymers have received widespread attention because of their unique properties, such as suitable for surface modification and increasing the functionality.

Building high-performance chemically amplified resists with polymer blends

2002 ◽  
Author(s):  
Qinghuang Lin ◽  
John P. Simons ◽  
Marie Angelopoulos ◽  
Ratnam Sooriyakumaran
Keyword(s):  
Polymer Blends ◽  
High Performance ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

2020 ◽  
Vol 59 (8) ◽  
pp. 086506
Author(s):  
Yuta Ikari ◽  
Kazumasa Okamoto ◽  
Akihiro Konda ◽  
Takahiro Kozawa ◽  
Takao Tamura
Keyword(s):  
Radiation Chemistry ◽  
Heating Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics

2014 ◽  
Vol 13 (4) ◽  
pp. 043017 ◽  
Author(s):  
Abhijit A. Patil ◽  
Yogendra Narayan Pandey ◽  
Manolis Doxastakis ◽  
Gila E. Stein
Keyword(s):  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists

2006 ◽  
Vol 45 (No. 46) ◽  
pp. L1230-L1231
Author(s):  
Katsumi Maeda ◽  
Kaichiro Nakano ◽  
Masamitsu Shirai
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists

6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists

2009 ◽  
Author(s):  
Morihisa Hoga ◽  
Masaharu Fukuda ◽  
Tsuyoshi Chiba ◽  
Mikio Ishikawa ◽  
Kimio Itoh ◽  
...  
Keyword(s):  
Patterned Media ◽  
Chemically Amplified ◽  
Chemically Amplified Resists
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