A schottky barrier junction based on nanometer-scale interpenetrating GaP/Gold networks

1997 ◽  
Vol 9 (7) ◽  
pp. 575-578 ◽  
Author(s):  
Daniel Vanmaekelbergh ◽  
Alfred Koster ◽  
Francisco Iranzo Marín
2019 ◽  
Vol 797 ◽  
pp. 582-588 ◽  
Author(s):  
Neetika ◽  
Sandeep Kumar ◽  
Amit Sanger ◽  
Hemant K. Chourasiya ◽  
Ashish Kumar ◽  
...  

2011 ◽  
Vol 1305 ◽  
Author(s):  
K. Sawano ◽  
Y. Hoshi ◽  
K. Kasahara ◽  
K. Yamane ◽  
K. Hamaya ◽  
...  

ABSTRACTWe demonstrate low-resistivity Ohmic contacts for n-Ge with ultra-shallow junction. Using the impurity δ-doping techniques with Ge homoepitaxy on Ge(111) below 400 ºC, we can achieve a very abrupt doping profile within a nanometer-scale width. By introducing the δ-doping to atomically controlled metal/Ge contacts, the current-voltage characteristics clearly show Ohmic conductions owing to the effective tunneling through the Schottky barrier. This approach is promising for a formation technology of ultra-shallow source/drain contacts for scaled Ge devices.


2002 ◽  
Vol 389-393 ◽  
pp. 275-278 ◽  
Author(s):  
Yuuki Ishida ◽  
Mitsuhiro Kushibe ◽  
Tetsuo Takahashi ◽  
Hajime Okumura ◽  
Sadafumi Yoshida

Nano Letters ◽  
2003 ◽  
Vol 3 (12) ◽  
pp. 1751-1755 ◽  
Author(s):  
Xiaojing Yang ◽  
Michael A. Guillorn ◽  
Derek Austin ◽  
Anatoli V. Melechko ◽  
Hongtao Cui ◽  
...  

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