Room‐Temperature Micropillar Growth of Lithium–Titanate–Carbon Composite Structures by Self‐Biased Direct Current Magnetron Sputtering for Lithium Ion Microbatteries

Jarkko Etula; Katja Lahtinen; Niklas Wester; Ajai Iyer; Kai Arstila; Timo Sajavaara; Tanja Kallio; Ulf Helmersson; Jari Koskinen

doi:10.1002/adfm.201904306

Room‐Temperature Micropillar Growth of Lithium–Titanate–Carbon Composite Structures by Self‐Biased Direct Current Magnetron Sputtering for Lithium Ion Microbatteries

Advanced Functional Materials ◽

10.1002/adfm.201904306 ◽

2019 ◽

Vol 29 (42) ◽

pp. 1904306 ◽

Cited By ~ 1

Author(s):

Jarkko Etula ◽

Katja Lahtinen ◽

Niklas Wester ◽

Ajai Iyer ◽

Kai Arstila ◽

...

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Composite Structures ◽

Room Temperature ◽

Lithium Ion ◽

Lithium Titanate ◽

Carbon Composite ◽

Direct Current Magnetron Sputtering

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Effect of Thermal Annealing up to 200°C on SnO Thin Films Deposited at Room Temperature by Direct Current Magnetron Sputtering

2020 IEEE Latin America Electron Devices Conference (LAEDC) ◽

10.1109/laedc49063.2020.9073260 ◽

2020 ◽

Author(s):

Samuel. Martinez-Arreola ◽

Salvador I. Garduno ◽

Norberto Hernandez-Como ◽

Magali Estrada

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Thermal Annealing ◽

Direct Current ◽

Room Temperature ◽

Direct Current Magnetron Sputtering

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Room temperature deposition of high figure of merit Al-doped zinc oxide by pulsed-direct current magnetron sputtering: Influence of energetic negative ion bombardment on film's optoelectronic properties

Thin Solid Films ◽

10.1016/j.tsf.2014.08.023 ◽

2014 ◽

Vol 569 ◽

pp. 44-51 ◽

Cited By ~ 11

Author(s):

F. Fumagalli ◽

J. Martí-Rujas ◽

F. Di Fonzo

Keyword(s):

Zinc Oxide ◽

Magnetron Sputtering ◽

Direct Current ◽

Figure Of Merit ◽

Room Temperature ◽

Negative Ion ◽

Direct Current Magnetron Sputtering ◽

Temperature Deposition ◽

High Figure ◽

Pulsed Direct Current

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Transparent conductive In2O3:Mo thin films prepared by reactive direct current magnetron sputtering at room temperature

Thin Solid Films ◽

10.1016/j.tsf.2005.11.012 ◽

2006 ◽

Vol 500 (1-2) ◽

pp. 70-73 ◽

Cited By ~ 63

Author(s):

Wei-na Miao ◽

Xi-feng Li ◽

Qun Zhang ◽

Li Huang ◽

Zhuang-jian Zhang ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Room Temperature ◽

Direct Current Magnetron Sputtering

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Characteristics of N-Type Polycrystalline Silicon Thin Films on Glass Substrates Deposited at Room Temperature by Direct Current Magnetron Sputtering under Substrate Biases

Japanese Journal of Applied Physics ◽

10.1143/jjap.48.056505 ◽

2009 ◽

Vol 48 (5) ◽

pp. 056505 ◽

Cited By ~ 1

Author(s):

Min Yen Yeh ◽

Chin Cheng Lee ◽

Guan Yeu Tzeng ◽

Yi Fang Luo

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Direct Current ◽

Polycrystalline Silicon ◽

Room Temperature ◽

Glass Substrates ◽

Silicon Thin Films ◽

Direct Current Magnetron Sputtering

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Deposition and corrosion behavior of -oriented vanadium thick films by direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2020.138491 ◽

2020 ◽

pp. 138491

Author(s):

Song Zhang ◽

Wenhua Xu ◽

Jun Li ◽

Rong Tu

Keyword(s):

Magnetron Sputtering ◽

Corrosion Behavior ◽

Direct Current ◽

Thick Films ◽

Direct Current Magnetron Sputtering

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The growth of a multi-principal element (CoCrFeMnNi) oxynitride film by direct current magnetron sputtering using air as reactive gas

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2021.127433 ◽

2021 ◽

pp. 127433

Author(s):

G. Radnóczi ◽

R. Dedoncker ◽

G.Z. Radnóczi ◽

Zs. Czigány ◽

A. Sulyok ◽

...

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Principal Element ◽

Direct Current Magnetron Sputtering ◽

Oxynitride Film ◽

Reactive Gas

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ZrCuAlNi thin film metallic glass grown by high power impulse and direct current magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2021.127029 ◽

2021 ◽

pp. 127029

Author(s):

Niklas Bönninghoff ◽

Wahyu Diyatmika ◽

Jinn P. Chu ◽

Stanislav Mráz ◽

Jochen M. Schneider ◽

...

Keyword(s):

Thin Film ◽

Metallic Glass ◽

Magnetron Sputtering ◽

Direct Current ◽

High Power ◽

Direct Current Magnetron Sputtering

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Synthesis and characterization of Cu3N–WC nanocomposite films prepared by direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2010.05.053 ◽

2010 ◽

Vol 518 (18) ◽

pp. 5227-5232 ◽

Cited By ~ 7

Author(s):

Shihong Zhang ◽

Yinsheng He ◽

Mingxi Li ◽

Yizhu He ◽

Sikchol Kwon ◽

...

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Nanocomposite Films ◽

Synthesis And Characterization ◽

Direct Current Magnetron Sputtering

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Tungsten-doped ZnO transparent conducting films deposited by direct current magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2010.05.010 ◽

2010 ◽

Vol 85 (2) ◽

pp. 184-186 ◽

Cited By ~ 16

Author(s):

Huafu Zhang ◽

Hanfa Liu ◽

Chengxin Lei ◽

Changkun Yuan ◽

Aiping Zhou

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Transparent Conducting Films ◽

Transparent Conducting ◽

Direct Current Magnetron Sputtering ◽

Doped Zno

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Compositional dependence of stress in silver copper alloys prepared by direct current magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577799 ◽

1992 ◽

Vol 10 (6) ◽

pp. 3439-3444 ◽

Cited By ~ 1

Author(s):

A. M. Kazakos ◽

D. E. Fahnline ◽

R. Messier ◽

L. J. Pilione

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Copper Alloys ◽

Compositional Dependence ◽

Silver Copper ◽

Direct Current Magnetron Sputtering

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