A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub-10 nm Microdomains in Si-Containing Block Copolymer Thin Films

2014 ◽  
Vol 24 (44) ◽  
pp. 6981-6988 ◽  
Author(s):  
Eunjin Kim ◽  
Wonjung Kim ◽  
Kwang Hee Lee ◽  
Caroline A. Ross ◽  
Jeong Gon Son
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Solvent Annealing ◽  
Perpendicular Orientation

Solvent Annealing Induced Perpendicular Orientation of Microdomains in Block Copolymer Thin Films

2014 ◽  
Vol 71 (3) ◽  
pp. 104-111
Author(s):  
Katsuhiro YAMAMOTO ◽  
Koji OHARA ◽  
Guanghui CUI ◽  
Ryo TANAKA ◽  
Daiki SHIMADA ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Solvent Annealing ◽  
Perpendicular Orientation

Study Morphology Transitions in Self-Assembled Triblock Copolymer Thin Films with Nanostructures by AFM

2006 ◽  
Vol 532-533 ◽  
pp. 165-168
Author(s):  
Yong Zhi Cao ◽  
Shen Dong ◽  
Ying Chun Liang ◽  
Tao Sun
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Triblock Copolymer ◽  
Low Cost ◽  
Orientational Order ◽  
Solvent Annealing ◽  
Force Microscopy ◽  
Atomic Force ◽  
Ordered Nanostructures ◽  
Self Assembled

As a “bottom-up” approach to nanostructures for nanofabrication, self-assembled block copolymer thin films have received much attention not only thanks to the scale of the microdomains but also due to the convenient shape tunability. In order to realize applications of self-assembled block copolymer thin films in nanotechnologies, control over microdomain spatial and orientational order is paramount. In this paper, using atomic force microscopy (AFM), we studied systemically nanostructure transitions induced by post-solvent annealing in self-assembled block copolymer thin films. Furthermore, a variety of thin films with well-ordered nanostructures, which can be employed as templates for nanotechnologies, have been realized simply and at low cost.

Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing

2014 ◽  
Vol 4 (1) ◽  
pp. 11-15 ◽  
Author(s):  
Su-Mi Hur ◽  
Gurdaman S. Khaira ◽  
Abelardo Ramírez-Hernández ◽  
Marcus Müller ◽  
Paul F. Nealey ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Defect Reduction ◽  
Solvent Annealing

Controlled Ordering of Block Copolymer Gyroid Thin Films by Solvent Annealing

2013 ◽  
Vol 47 (1) ◽  
pp. 175-182 ◽  
Author(s):  
Ming-Shiuan She ◽  
Ting-Ya Lo ◽  
Rong-Ming Ho
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Solvent Annealing

Ordering evolution of block copolymer thin films upon solvent-annealing process

2012 ◽  
Vol 383 (1) ◽  
pp. 118-123 ◽  
Author(s):  
Dong Hyun Lee ◽  
Heesook Cho ◽  
Seungmin Yoo ◽  
Soojin Park
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Annealing Process ◽  
Solvent Annealing

Perpendicular orientation of cylindrical domains upon solvent annealing thin films of polystyrene-b-polylactide

2010 ◽  
Vol 518 (14) ◽  
pp. 3710-3715 ◽  
Author(s):  
Marylène Vayer ◽  
Marc A. Hillmyer ◽  
Mohammed Dirany ◽  
Guillaume Thevenin ◽  
René Erre ◽  
...  
Keyword(s):  
Thin Films ◽  
Solvent Annealing ◽  
Perpendicular Orientation ◽  
Cylindrical Domains

Cyclic Solvent Annealing Improves Feature Orientation in Block Copolymer Thin Films

2016 ◽  
Vol 49 (5) ◽  
pp. 1743-1751 ◽  
Author(s):  
Sean P. Paradiso ◽  
Kris T. Delaney ◽  
Carlos J. García-Cervera ◽  
Hector D. Ceniceros ◽  
Glenn H. Fredrickson
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Solvent Annealing
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