Surface Nanometer-Scale Patterning in Realizing Large-Scale Ordered Arrays of Metallic Nanoshells with Well-Defined Structures and Controllable Properties

2010 ◽  
Vol 20 (15) ◽  
pp. 2527-2533 ◽  
Author(s):  
Shikuan Yang ◽  
Weiping Cai ◽  
Lingce Kong ◽  
Yong Lei
Keyword(s):  
Large Scale ◽  
Nanometer Scale ◽  
Ordered Arrays

scholarly journals Additive-Enhanced Exfoliation for High-Yield 2D Materials Production

Nanomaterials ◽  
2021 ◽  
Vol 11 (3) ◽  
pp. 601
Author(s):  
Dinh-Tuan Nguyen ◽  
Hsiang-An Ting ◽  
Yen-Hsun Su ◽  
Mario Hofmann ◽  
Ya-Ping Hsieh
Keyword(s):  
Large Scale ◽  
2D Materials ◽  
Transition Metal Dichalcogenides ◽  
Spectroscopic Characterization ◽  
High Yield ◽  
Nanometer Scale ◽  
Efficient Production ◽  
Device Performance ◽  
Metal Dichalcogenides ◽  
Scale Deposition

The success of van-der-Waals electronics, which combine large-scale-deposition capabilities with high device performance, relies on the efficient production of suitable 2D materials. Shear exfoliation of 2D materials’ flakes from bulk sources can generate 2D materials with low amounts of defects, but the production yield has been limited below industry requirements. Here, we introduce additive-assisted exfoliation (AAE) as an approach to significantly increase the efficiency of shear exfoliation and produce an exfoliation yield of 30%. By introducing micrometer-sized particles that do not exfoliate, the gap between rotor and stator was dynamically reduced to increase the achievable shear rate. This enhancement was applied to WS2 and MoS2 production, which represent two of the most promising 2D transition-metal dichalcogenides. Spectroscopic characterization and cascade centrifugation reveal a consistent and significant increase in 2D material concentrations across all thickness ranges. Thus, the produced WS2 films exhibit high thickness uniformity in the nanometer-scale and can open up new routes for 2D materials production towards future applications.

Magnetic Nanoparticle Arrays with Ultra-Uniform Length Electrodeposited in Highly Ordered Alumina Nanopores(“Alumite”)

2000 ◽  
Vol 636 ◽  
Author(s):  
Robert M. Metzger ◽  
Ming Sun ◽  
Giovanni Zangari ◽  
Mohammad Shamsuzzoha
Keyword(s):  
Magnetic Nanoparticles ◽  
Magnetic Nanoparticle ◽  
Great Promise ◽  
Nanometer Scale ◽  
Nanoparticle Arrays ◽  
Low Aspect Ratio ◽  
Ordered Arrays ◽  
High Uniformity ◽  
Pulse Reverse ◽  
Hexagonally Ordered

AbstractWe report nanometer-scale ordered arrays of cylindrical magnetic nanoparticles with low aspect ratio and ultra-high uniformity. Protracted anodization provides hexagonally ordered nanopores in amorphous Al2O3. For instance, pulsed electrochemical deposition grows Co particles of uniform length from the bottoms of these pores: these particles are polycrystalline and randomly oriented. The magnetism of the array is dominated by particle shape and by inter-particle magnetostatic interactions. A very clear transition of the anisotropy from perpendicular to in-plane is observed at a height to radius ratio of about 2. This pulse-reverse electrodeposition shows great promise for a reliable synthesis of uniform nanostructures of many metals.

Sub-nanometer scale size-control of iron oxide nanoparticles with drying time of iron oleate

CrystEngComm ◽  
2019 ◽  
Vol 21 (27) ◽  
pp. 4063-4071 ◽  
Author(s):  
Thiruparasakthi Balakrishnan ◽  
Min-Jae Lee ◽  
Jahar Dey ◽  
Sung-Min Choi
Keyword(s):  
Decomposition Method ◽  
Large Scale ◽  
Size Control ◽  
Nanometer Scale ◽  
Reliable Control ◽  
Drying Time ◽  
Thermal Decomposition Method ◽  
Scale Size ◽  
Fine Size ◽  
Scale Step

The drying time of iron oleate as a single and reliable control parameter for the fine size control (with a sub-nanometer scale step) of monodisperse IONPs in the large-scale thermal decomposition method.

Metallic 10 nm Diameter Magnetic Sensors and Large-Scale Ordered Arrays

2014 ◽  
Vol 50 (11) ◽  
pp. 1-5 ◽  
Author(s):  
Sang-Yeob Sung ◽  
Mazin M. Maqableh ◽  
Xiaobo Huang ◽  
K. Sai Madhukar Reddy ◽  
R. H. Victora ◽  
...  
Keyword(s):  
Large Scale ◽  
Magnetic Sensors ◽  
Ordered Arrays

scholarly journals Nanolithography for VLSI and ULSI

1989 ◽  
Vol 7 (3) ◽  
pp. 539-544
Author(s):  
Susumu Namba
Keyword(s):  
Large Scale ◽  
Nanometer Scale ◽  
Research Subject ◽  
Photon Beams ◽  
Major Research ◽  
Large Scale Integration ◽  
Scale Integration

Lithography techniques hold the key to achieving ultra large-scale integration (ULSI) and they have been a major research subject. For fabrication of ULSI devices, a quarter micron or smaller pattern delineation with nanometer scale accuracy is required. Various techniques using electron, ion and photon beams have been investigated to fulfill these requirements. The present paper discusses the characteristics of several key lithography techniques and their limitations.

The UTAM Nano-Patterning: A New Surface Nano-Patterning Technique in Fabricating Ordered Arrayed Surface Nanostructures

2007 ◽  
Author(s):  
Yong Lei ◽  
Gerhard Wilde
Keyword(s):  
Large Scale ◽  
Structural Parameters ◽  
Low Cost ◽  
Nanoparticle Arrays ◽  
Ordered Arrays ◽  
Surface Nanostructures ◽  
Patterning Technique ◽  
Ordered Nanostructures ◽  
Controllable Size ◽  
Nano Patterning

A new surface nano-patterning technique, the so-called UTAM nano-patterning approach, is reported here in this paper. Using the UTAM nano-patterning technique, large-scale arrays of highly ordered nanostructures (nanoparticles and nanoholes) in the range of square centimeters have been fabricated on substrates in a massive parallel way. The resulting nanostructures are characterized by highly defined and controllable size, shape, composition, and spacing of the nanostructures. By changing the structural parameters of the nanoparticles, the properties of the nanoparticle arrays can be tuned. This non-lithographic surface nano-patterning approach provides an efficient and low-cost alternative in fabricating large-scale ordered arrays of surface nanostructures.

scholarly journals Microtopographical guidance of macropinocytic signaling patches

2021 ◽  
Vol 118 (50) ◽  
pp. e2110281118
Author(s):  
Gen Honda ◽  
Nen Saito ◽  
Taihei Fujimori ◽  
Hidenori Hashimura ◽  
Mitsuru J. Nakamura ◽  
...  
Keyword(s):  
Immune Cells ◽  
Large Scale ◽  
Nanometer Scale ◽  
Distinct Mode ◽  
Structured Surfaces ◽  
Curvature Sensing ◽  
Quantitative Image ◽  
Membrane Protrusions ◽  
Particle Ingestion ◽  
Micrometer Scale

In fast-moving cells such as amoeba and immune cells, dendritic actin filaments are spatiotemporally regulated to shape large-scale plasma membrane protrusions. Despite their importance in migration, as well as in particle and liquid ingestion, how their dynamics are affected by micrometer-scale features of the contact surface is still poorly understood. Here, through quantitative image analysis of Dictyostelium on microfabricated surfaces, we show that there is a distinct mode of topographical guidance directed by the macropinocytic membrane cup. Unlike other topographical guidance known to date that depends on nanometer-scale curvature sensing protein or stress fibers, the macropinocytic membrane cup is driven by the Ras/PI3K/F-actin signaling patch and its dependency on the micrometer-scale topographical features, namely PI3K/F-actin–independent accumulation of Ras-GTP at the convex curved surface, PI3K-dependent patch propagation along the convex edge, and its actomyosin-dependent constriction at the concave edge. Mathematical model simulations demonstrate that the topographically dependent initiation, in combination with the mutually defining patch patterning and the membrane deformation, gives rise to the topographical guidance. Our results suggest that the macropinocytic cup is a self-enclosing structure that can support liquid ingestion by default; however, in the presence of structured surfaces, it is directed to faithfully trace bent and bifurcating ridges for particle ingestion and cell guidance.

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