Applications of the Jupiter Global Ionosphere‐Thermosphere Model: A case study of auroral electron energy deposition

2017 ◽  
Vol 122 (2) ◽  
pp. 2210-2236
Author(s):  
Austin Egert ◽  
J. Hunter Waite ◽  
Jared Bell
2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.


1973 ◽  
Vol 5 (4) ◽  
pp. 239-262 ◽  
Author(s):  
L.R. Peterson ◽  
T. Sawada ◽  
J.N. Bass ◽  
A.E.S. Green

1988 ◽  
Vol 36 (4) ◽  
pp. 329-352 ◽  
Author(s):  
J.L. Fox ◽  
G.A. Victor

1980 ◽  
Vol 51 (5) ◽  
pp. 2569
Author(s):  
E. J. T. Burns ◽  
J. Chang ◽  
A. V. Farnsworth ◽  
J. P. VanDevender ◽  
M. M. Widner ◽  
...  

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