In situ observations of multistage electron acceleration driven by magnetic reconnection

2015 ◽  
Vol 120 (8) ◽  
pp. 6320-6331 ◽  
Author(s):  
Mingyu Wu ◽  
Can Huang ◽  
Quanming Lu ◽  
Martin Volwerk ◽  
Rumi Nakamura ◽  
...  
2020 ◽  
Vol 246 (2) ◽  
pp. 34 ◽  
Author(s):  
T. D. Phan ◽  
S. D. Bale ◽  
J. P. Eastwood ◽  
B. Lavraud ◽  
J. F. Drake ◽  
...  

2005 ◽  
Vol 23 (8) ◽  
pp. 2903-2907 ◽  
Author(s):  
J. A. Wild ◽  
S. E. Milan ◽  
J. A. Davies ◽  
S. W. H. Cowley ◽  
C. M. Carr ◽  
...  

Abstract. We present a space- and ground-based study exploiting data from the coordinated Cluster and Double Star missions in order to investigate dayside magnetic reconnection under BY+ dominated IMF conditions. In-situ observations of magnetosheath flux transfer events combined with measurements of pulsed poleward and dawnward directed flows in the pre-noon sector high-latitude northern hemisphere ionosphere are interpreted as indications of pulsed magnetic reconnection during an interval in which the IMF remained relatively steady. Observations of newly-reconnected magnetic flux tubes anchored in the northern hemisphere both at mid-latitudes and in the vicinity of the subsolar point suggests that during BY+ dominated IMF, reconnection is not, as proposed previously, limited to the high-latitude magnetopause.


2015 ◽  
Vol 12 (3) ◽  
pp. 268-271 ◽  
Author(s):  
C. S. Arridge ◽  
J. P. Eastwood ◽  
C. M. Jackman ◽  
G.-K. Poh ◽  
J. A. Slavin ◽  
...  

2016 ◽  
Vol 121 (1) ◽  
pp. 205-213 ◽  
Author(s):  
S. Y. Huang ◽  
A. Retino ◽  
T. D. Phan ◽  
W. Daughton ◽  
A. Vaivads ◽  
...  

Author(s):  
T. Marieb ◽  
J. C. Bravman ◽  
P. Flinn ◽  
D. Gardner ◽  
M. Madden

Electromigration and stress voiding have been active areas of research in the microelectronics industry for many years. While accelerated testing of these phenomena has been performed for the last 25 years[1-2], only recently has the introduction of high voltage scanning electron microscopy (HVSEM) made possible in situ testing of realistic, passivated, full thickness samples at high resolution.With a combination of in situ HVSEM and post-testing transmission electron microscopy (TEM) , electromigration void nucleation sites in both normal polycrystalline and near-bamboo pure Al were investigated. The effect of the microstructure of the lines on the void motion was also studied.The HVSEM used was a slightly modified JEOL 1200 EX II scanning TEM with a backscatter electron detector placed above the sample[3]. To observe electromigration in situ the sample was heated and the line had current supplied to it to accelerate the voiding process. After testing lines were prepared for TEM by employing the plan-view wedge technique [6].


2013 ◽  
Vol 133 (4) ◽  
pp. 166-172 ◽  
Author(s):  
Shuji Kamio ◽  
Kotaro Yamasaki ◽  
Koichiro Takemura ◽  
Qinghong Cao ◽  
Takenori G. Watanabe ◽  
...  

2021 ◽  
Vol 51 (1) ◽  
Author(s):  
Sze Hoon Gan ◽  
Zarinah Waheed ◽  
Fung Chen Chung ◽  
Davies Austin Spiji ◽  
Leony Sikim ◽  
...  

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