Sample Introduction Procedures for Inductively Coupled Plasmas

Analytical Techniques in the Sciences - Practical Inductively Coupled Plasma Spectroscopy ◽

10.1002/047009351x.ch3 ◽

2005 ◽

pp. 39-56

Keyword(s):

Sample Introduction ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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A membrane interface for organic solvent sample introduction into inductively coupled plasmas

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(89)80103-x ◽

1989 ◽

Vol 44 (10) ◽

pp. 1041-1048 ◽

Cited By ~ 27

Author(s):

Kenneth Bäckström ◽

Anders Gustavsson ◽

Pentti Hietala

Keyword(s):

Organic Solvent ◽

Sample Introduction ◽

Inductively Coupled Plasmas ◽

Membrane Interface ◽

Inductively Coupled ◽

Coupled Plasmas

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Elimination of arcing in induction heating-electrothermal vaporization (IH-ETV) for sample introduction into inductively coupled plasmas

Journal of Analytical Atomic Spectrometry ◽

10.1039/b212593p ◽

2003 ◽

Vol 18 (5) ◽

pp. 485-486 ◽

Cited By ~ 5

Author(s):

J. M. Ren ◽

Michael E. Rybak ◽

Eric D. Salin

Keyword(s):

Induction Heating ◽

Sample Introduction ◽

Electrothermal Vaporization ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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Determination of Nb and Ta in Nb/Ta minerals by inductively coupled plasmas optical emission spectrometry using slurry sample introduction

Microchemical Journal ◽

10.1016/j.microc.2006.03.010 ◽

2006 ◽

Vol 84 (1-2) ◽

pp. 22-25 ◽

Cited By ~ 7

Author(s):

Xuejie Song ◽

Taicheng Duan ◽

Pengran Guo ◽

Hangting Chen

Keyword(s):

Optical Emission ◽

Optical Emission Spectrometry ◽

Sample Introduction ◽

Emission Spectrometry ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Slurry Sample ◽

Coupled Plasmas

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A membrane interface for aqueous sample introduction into inductively coupled plasmas

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(90)80173-g ◽

1990 ◽

Vol 45 (10) ◽

pp. 1103-1108 ◽

Cited By ~ 16

Author(s):

Anders Gustavsson ◽

Pentti Hietala

Keyword(s):

Sample Introduction ◽

Aqueous Sample ◽

Inductively Coupled Plasmas ◽

Membrane Interface ◽

Inductively Coupled ◽

Coupled Plasmas

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Sample introduction for inductively coupled plasmas and flames

TrAC Trends in Analytical Chemistry ◽

10.1016/0165-9936(83)88013-3 ◽

1983 ◽

Vol 2 (5) ◽

pp. 121-124 ◽

Cited By ~ 13

Author(s):

Richard F. Browner

Keyword(s):

Sample Introduction ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)]

Journal of Applied Physics ◽

10.1063/5.0023888 ◽

2020 ◽

Vol 128 (8) ◽

pp. 089901

Author(s):

Chenhui Qu ◽

Steven J. Lanham ◽

Steven C. Shannon ◽

Sang Ki Nam ◽

Mark J. Kushner

Keyword(s):

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Power Matching ◽

Coupled Plasmas

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Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

Microelectronic Engineering ◽

10.1016/j.mee.2005.09.007 ◽

2006 ◽

Vol 83 (2) ◽

pp. 328-335 ◽

Cited By ~ 39

Author(s):

S.W. Na ◽

M.H. Shin ◽

Y.M. Chung ◽

J.G. Han ◽

S.H. Jeung ◽

...

Keyword(s):

Thin Films ◽

Zno Thin Films ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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Modelling inductively coupled plasmas: a sensitivity study on plasma chemistry and surface chemistry

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01054-4 ◽

2001 ◽

Vol 142-144 ◽

pp. 531-535

Author(s):

M. Nold ◽

S. Kleditzsch ◽

U. Riedel

Keyword(s):

Surface Chemistry ◽

Plasma Chemistry ◽

Sensitivity Study ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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Nonlinear electromagnetic fields in 0.5 MHz inductively coupled plasmas

Physics of Plasmas ◽

10.1063/1.1557871 ◽

2003 ◽

Vol 10 (4) ◽

pp. 1146-1151 ◽

Cited By ~ 7

Author(s):

K. Ostrikov ◽

E. Tsakadze ◽

S. Xu ◽

S. V. Vladimirov ◽

R. Storer

Keyword(s):

Electromagnetic Fields ◽

Inductively Coupled Plasmas ◽

Inductively Coupled ◽

Coupled Plasmas

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Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. II. Ar/Cl2 pulsed plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1434965 ◽

2002 ◽

Vol 20 (2) ◽

pp. 325-334 ◽

Cited By ~ 34

Author(s):

Pramod Subramonium ◽

Mark J. Kushner

Keyword(s):

Two Dimensional ◽

Inductively Coupled Plasmas ◽

Pulsed Plasmas ◽

Inductively Coupled ◽

Dimensional Modeling ◽

Coupled Plasmas

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